Y10S 430/143
Electron beam
Y10S430/143 (Electron beam) appears on 827 US grants and 420 published applications in this corpus.
Search patents in Y10S- Granted patents
- 827
- Published applications
- 420
- Assignees
- 268
- Inventors
- 1,219
- Latest grant
- 27 Mar 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 22 | 0 |
| 1977 | 16 | 0 |
| 1978 | 5 | 0 |
| 1979 | 2 | 0 |
| 1980 | 5 | 0 |
| 1981 | 14 | 0 |
| 1982 | 8 | 0 |
| 1983 | 3 | 0 |
| 1984 | 6 | 0 |
| 1985 | 7 | 0 |
| 1986 | 14 | 0 |
| 1987 | 13 | 0 |
| 1988 | 9 | 0 |
| 1989 | 12 | 0 |
| 1990 | 8 | 0 |
| 1991 | 5 | 0 |
| 1992 | 15 | 0 |
| 1993 | 17 | 0 |
| 1994 | 15 | 0 |
| 1995 | 19 | 0 |
| 1996 | 28 | 0 |
| 1997 | 14 | 0 |
| 1998 | 17 | 0 |
| 1999 | 32 | 0 |
| 2000 | 35 | 0 |
| 2001 | 29 | 15 |
| 2002 | 41 | 53 |
| 2003 | 53 | 50 |
| 2004 | 44 | 41 |
| 2005 | 35 | 31 |
| 2006 | 34 | 22 |
| 2007 | 29 | 30 |
| 2008 | 24 | 26 |
| 2009 | 26 | 30 |
| 2010 | 37 | 27 |
| 2011 | 38 | 19 |
| 2012 | 30 | 15 |
| 2013 | 17 | 26 |
| 2014 | 27 | 20 |
| 2015 | 11 | 9 |
| 2016 | 9 | 2 |
| 2017 | 1 | 2 |
| 2018 | 1 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- Dual exposure patterning of a photomask to print a contact, a via or curvilinear shape on an integrated circuit27 Mar 2018US 9,927,698 B2Globalfoundries Inc.
- Method and system for forming patterns using charged particle beam lithography with variable pattern dosage18 Apr 2017US 9,625,809 B2D2S, Inc.
- Method and system for forming patterns with charged particle beam lithography11 Oct 2016US 9,465,297 B2D2S, Inc.
- Method for fracturing and forming a pattern using shaped beam charged particle beam lithography20 Sep 2016US 9,448,473 B2D2S, Inc.
- Method and system for forming patterns using charged particle beam lithography with variable pattern dosage21 Jun 2016US 9,372,391 B2D2S, Inc.
- Method and system for forming patterns using charged particle beam lithography with variable pattern dosage27 Dec 2018US 2018/0374675 A1D2S, Inc.
- Dual exposure patterning of a photomask to print a contact, a via or a curvilinear shape on an integrated circuit15 Feb 2018US 2018/0046073 A1Globalfoundries Inc.
- Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage27 Jul 2017US 2017/0213698 A1D2S, Inc.
- Method and system for forming patterns with charged particle beam lithography26 Jan 2017US 2017/0023862 A1D2S, Inc.
- Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage13 Oct 2016US 2016/0299422 A1D2S, Inc.
Most cited
By later US patents
- Selective photoresist hardening to facilitate lateral trimming537US 6,716,571 B2Advanced Micro Devices, Inc. · 2004
- Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion469US 6,924,078 B2Dongjin Semichem Co., Ltd. · 2005
- Optical proximity correction system347US 6,077,310 AKabushiki Kaisha Toshiba · 2000
- Molecularly imprinted materials, method for their preparation and devices employing such materials249US 5,587,273 AAdvanced Microbotics Corporation · 1996
- Process for reducing edge roughness in patterned photoresist182US 6,709,807 B2Axcelis Technologies, Inc. · 2004