Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
AssigneeD2S, Inc.
InventorsAkira Fujimura, Harold Robert Zable
Life of this patent
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Abstract
A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where the set of shots provides different dosages to different parts of the pattern, and where the dose margin from the set of shots is calculated. A method for forming patterns on a surface is also disclosed.
Claims19
-25. (canceled)
A method for fracturing or mask data preparation or proximity effect correction or optical proximity correction or mask process correction, the method comprising:
- determining a plurality of shaped beam charged particle beam shots (“shaped beam shots”) for an exposure pass, wherein the plurality of shaped beam shots is capable of forming a pattern on a surface, wherein at least two shots in the plurality of shaped beam shots are designed to overlap in the exposure pass, wherein the step of determining comprises calculating a dose margin from the plurality of shaped beam shots, and wherein the step of determining is performed using one or more computing hardware processors.
A method for fracturing or mask data preparation or proximity effect correction or optical proximity correction or mask process correction, the method comprising:
- determining a plurality of shaped beam charged particle beam shots (“shaped beam shots”) for an exposure pass, wherein a shape of a first charged particle beam for a first shot in the plurality of shaped beam shots overlaps a shape of a second charged particle beam for a second shot in the plurality of shaped beam shots, wherein the plurality of shaped beam shots is capable of forming a pattern on a surface, wherein the step of determining comprises calculating a dose margin from the plurality of shaped beam shots, and wherein the step of determining is performed using one or more computing hardware processors.
Dependencies are inferred from the claim text.