Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Yuichi Mukai, Satoshi Yamamoto
Life of this patent
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Abstract
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to C17 divalent saturated hydrocarbon group; R5 represents a group having cyclic ether structure; and Z1+ represents an organic cation.
Claims7
A resist composition comprising
- (A1) a resin having a structural unit represented by the formula (I),
- (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and
- (B) an acid generator represented by the formula (II),
- wherein R1 represents a hydrogen atom or a methyl group;
- A1 represents a C1 to C6 alkanediyl group;
- R2 represents a C1 to C10 hydrocarbon group having a fluorine atom;
- wherein R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- X1 represents an C1 to C17 divalent saturated hydrocarbon group, and one or more hydrogen atom contained in the divalent saturated hydrocarbon group may be replaced by a fluorine atom, one or more —CH2— contained in the divalent saturated hydrocarbon group may be replaced by —O— or —CO—;
- R5 represents a group having cyclic ether structure;
- and
- Z+ represents an organic cation.
Dependencies are inferred from the claim text.