Resist composition and method for producing resist pattern

A resist composition comprising

• (A1) a resin having a structural unit represented by the formula (I),
• (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and
• (B) an acid generator represented by the formula (II),
• wherein R1 represents a hydrogen atom or a methyl group;
• A1 represents a C1 to C6 alkanediyl group;
• R2 represents a C1 to C10 hydrocarbon group having a fluorine atom.
• wherein R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
• X1 represents an C1 to C17 divalent saturated hydrocarbon group, and one or more hydrogen atom contained in the divalent saturated hydrocarbon group may be replaced by a fluorine atom, one or more —CH2— contained in the divalent saturated hydrocarbon group may be replaced by —O— or —CO—;
• R5 represents a group having cyclic ether structure;
• and
• Z+ represents an organic cation.