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US 5,350,660 AGranted
Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere
AssigneeWako Pure Chemical Industries, Ltd.
InventorsFumiyoshi Urano, Masaaki Nakahata, Hirotoshi Fujie, Keiji Oono
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Abstract
A resist material comprising (a) a polymer having a monomer unit having a special functional group, a monomer unit having a phenolic hydroxyl group, and if necessary a third monomer unit, (b) a photoacid generator, and (c) a solvent can provide a resist film excellent in heat resistance and adhesiveness to a substrate when exposed to light with 300 nm or less such as deep UV light, KrF excimer laser light, etc., and is suitable for forming ultrafine patterns.
Claims19
A resist material comprising:
- (a) a polymer represented by the formula:
- ##STR20## wherein R.sup.1 is a methyl group, an isopropyl group, a tert-butyl group, a tetrahydropyranyl group, a trimethyl-silyl group or a tert-butoxycarbonyl group;
- R.sup.2 is a hydrogen atom or a methyl group;
- and k and p are independently an integer of 1 or more provided that k/(k+p)=0.1 to 0.9, said repeating units (I) having a functional group which becomes alkali-soluble by chemical change during heating in the presence of an acid generated from a photosensitive compound when exposed to light;
- (b) a photosensitive compound capable of generating an acid, when exposure to light, in an amount of 1 to 20 parts by weight per 100 parts by weight of said polymer;
- and
- (c) a solvent for dissolving the components (a) and (b).
4 more elements
A resist material comprising:
- (a) a polymer represented by the formula:
- ##STR28## wherein R.sup.1 is a methyl group, and isopropyl group, a tertbutyl group, a tetrahydropyranyl group, a trimethylsilyl group or a tert-butoxycarbonyl group;
- R.sup.2 is a hydrogen atom or a methyl group;
- R.sup.3 and R.sup.5 are independently a hydrogen atom or a methyl group;
- R.sup.4 is a hydrogen, carboxyl group, a cyano group, or a group of the formula:
- ##STR29## wherein R.sup.7 is a hydrogen atom, a halogen atom or a lower alkyl group;
- R.sup.6 is a hydrogen atom, a cyano group, or --COOR.sup.8, R.sup.8 is a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms;
- k', p' and m are independently an integer of 1 or more, provided that 0.1.ltoreq.k'/(k'+p').ltoreq.0.9 and 0.05.ltoreq.m/(k'+p'+m).ltoreq.0.50 said repeating units (II) having a functional group which becomes alkali-soluble by chemical change during heating in the presence of an acid generated from a photosensitive compound when exposed to light;
- (b) a photosensitive compound capable of generating an acid, when exposed to light, in an amount of 1 to 20 parts by weight per 100 parts by weight of said polymer;
- (c) a solvent for dissolving the components (a) and (b).
7 more elements
Dependencies are inferred from the claim text.