Y10S 430/117
Free radical
Y10S430/117 (Free radical) appears on 294 US grants and 83 published applications in this corpus.
Search patents in Y10S- Granted patents
- 294
- Published applications
- 83
- Assignees
- 107
- Inventors
- 551
- Latest grant
- 3 Jan 2012
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 7 | 0 |
| 1978 | 7 | 0 |
| 1979 | 3 | 0 |
| 1980 | 2 | 0 |
| 1981 | 21 | 0 |
| 1982 | 6 | 0 |
| 1983 | 8 | 0 |
| 1984 | 11 | 0 |
| 1985 | 10 | 0 |
| 1986 | 6 | 0 |
| 1987 | 3 | 0 |
| 1988 | 6 | 0 |
| 1989 | 13 | 0 |
| 1990 | 19 | 0 |
| 1991 | 11 | 0 |
| 1992 | 6 | 0 |
| 1993 | 9 | 0 |
| 1994 | 4 | 0 |
| 1995 | 6 | 0 |
| 1996 | 9 | 0 |
| 1997 | 6 | 0 |
| 1998 | 9 | 0 |
| 1999 | 13 | 0 |
| 2000 | 9 | 0 |
| 2001 | 7 | 1 |
| 2002 | 2 | 6 |
| 2003 | 4 | 14 |
| 2004 | 10 | 20 |
| 2005 | 9 | 11 |
| 2006 | 7 | 9 |
| 2007 | 11 | 9 |
| 2008 | 12 | 4 |
| 2009 | 12 | 6 |
| 2010 | 3 | 2 |
| 2011 | 8 | 1 |
| 2012 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method of making a lithographic printing plate3 Jan 2012US 8,088,560 B2Agfa Graphics NV
- Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same1 Nov 2011US 8,048,613 B2Taiyo Ink Mfg. Co., Ltd.
- Negative-working imageable elements11 Oct 2011US 8,034,538 B2Eastman Kodak Company
- Curable composition, image forming material, and planographic printing plate precursor6 Sep 2011US 8,012,671 B2FUJIFILM Corporation
- Photosensitive resin composition and adhesion promoter12 Jul 2011US 7,977,028 B2Toray Industries, Inc.
- Negative photosensitive fluorinated aromatic resin composition19 May 2011US 2011/0117496 A1Asahi Glass Company, Limited
- Negative-working imageable elements19 Aug 2010US 2010/0209846 A1Eastman Kodak Company
- On-press developable negative-working imageable elements21 Jan 2010US 2010/0015549 A1
- Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same28 May 2009US 2009/0136872 A1Dongjin Semichem Co., Ltd.
- Photosensitive resin composition and adhesion promoter14 May 2009US 2009/0123867 A1Toray Industries, Inc.
Most cited
By later US patents
- Ternary photoinitiator system for addition polymerization289US 5,545,676 AMinnesota Mining and Manufacturing Company · 1996
- Energy curable compositions: two component curing agents227US 4,985,340 AMinnesota Mining and Manufacturing Company · 1991
- Sensitizers for photopolymerization190US 4,308,400 ACiba-Geigy Corporation · 1981
- Cross-linked toner resins157US 5,227,460 AXerox Corporation · 1993
- Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same155US 4,772,541 AThe Mead Corporation · 1988