Y10S 430/126
Halogen compound containing
Y10S430/126 (Halogen compound containing) appears on 314 US grants and 178 published applications in this corpus.
Search patents in Y10S- Granted patents
- 314
- Published applications
- 178
- Assignees
- 103
- Inventors
- 549
- Latest grant
- 12 May 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 11 | 0 |
| 1977 | 5 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 10 | 0 |
| 1982 | 3 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 6 | 0 |
| 1986 | 7 | 0 |
| 1987 | 11 | 0 |
| 1988 | 4 | 0 |
| 1989 | 8 | 0 |
| 1990 | 8 | 0 |
| 1991 | 5 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 9 | 0 |
| 1995 | 8 | 0 |
| 1996 | 7 | 0 |
| 1997 | 4 | 0 |
| 1998 | 6 | 0 |
| 1999 | 0 | 0 |
| 2000 | 7 | 0 |
| 2001 | 3 | 4 |
| 2002 | 3 | 18 |
| 2003 | 4 | 16 |
| 2004 | 17 | 12 |
| 2005 | 10 | 20 |
| 2006 | 14 | 13 |
| 2007 | 18 | 18 |
| 2008 | 7 | 19 |
| 2009 | 21 | 16 |
| 2010 | 20 | 9 |
| 2011 | 17 | 8 |
| 2012 | 8 | 6 |
| 2013 | 7 | 18 |
| 2014 | 19 | 1 |
| 2015 | 9 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Resist composition and method of forming resist pattern12 May 2015US 9,029,070 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern, novel compound, and acid generator21 Apr 2015US 9,012,129 B2Tokyo Ohka Kogyo Co., Ltd.
- Sulfonium derivatives and the use therof as latent acids14 Apr 2015US 9,005,871 B2BASF SE
- Positive resist composition and method of forming resist pattern17 Mar 2015US 8,980,524 B2Tokyo Ohka Kogyo.Co., Ltd.
- Pattern forming process and resist compostion17 Mar 2015US 8,980,527 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition, method of forming resist pattern, novel compound, and acid generator1 May 2014US 2014/0120472 A1Tokyo Ohka Kogyo.Co., Ltd.
- Positive resist composition for immersion exposure and pattern forming method19 Dec 2013US 2013/0337384 A1FUJIFILM Corporation
- Radiation-sensitive resin composition and radiation-sensitive acid generating agent3 Oct 2013US 2013/0260316 A1Jsr Corporation
- Pattern forming process and resist compostion18 Jul 2013US 2013/0183621 A1Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive resin composition18 Jul 2013US 2013/0183624 A1Jsr Corporation
Most cited
By later US patents
- Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials165US 4,256,828 AMinnesota Mining and Manufacturing Company · 1981
- Fluorinated xanthene derivatives146US 6,162,931 AMolecular Probes, Inc. · 2000
- Fluorone and pyronin y derivatives126US 5,451,343 ASpectra Group Limited, Inc. · 1995
- Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere121US 5,350,660 AWako Pure Chemical Industries, Ltd. · 1994
- Photocurable compositions and methods105US 4,026,705 AGeneral Electric Company · 1977