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US 2013/0183624 A1Published application
Radiation-sensitive resin composition
AssigneeJsr Corporation
InventorKen MARUYAMA
Life of this patent
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Abstract
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.
Claims5
A radiation-sensitive resin composition comprising:
- a compound represented by a formula (1);
- and
- a polymer that serves as a base resin,
- wherein
- R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different,
- A is a divalent hydrocarbon group having 1 to 5 carbon atoms or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms,
- R is a fluorine atom or a hydrogen atom,
- a is an integer from 1 to 4, wherein in a case where a plurality of R are present, each of the plurality of R is either identical or different, and
- M+ is a monovalent cation.
6 more elements
Dependencies are inferred from the claim text.