Pattern forming process and resist compostion
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasaki Ohashi, Jun Hatakeyama
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Abstract
A resist composition is provided comprising a polymer comprising recurring units having a carboxyl group substituted with an acid labile group, an acid generator, a sulfonium or iodonium salt of fluoroalkanesulfonamide and an organic solvent. A positive pattern is formed by applying the resist composition onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, baking, and immersing in an alkaline developer to dissolve away the exposed region of resist film, but not the unexposed region.
Claims5
A resist composition comprising a polymer, an acid generator, a sulfonium salt or iodonium salt of fluoroalkanesulfonamide, and an organic solvent,
- said polymer comprising acid labile group-substituted recurring units having the general formula (1):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, Z is a single bond, phenylene, naphthylene or (backbone)-C(═O)—O—Z′—, Z′ is a straight, branched or cyclic C1-C10 alkylene group which may contain a hydroxyl radical, ether bond, ester bond, or lactone ring, or a phenylene or naphthylene group, and XA is an acid labile group,
- said sulfonium salt or iondonium salt of fluoroalkanesulfonaminde being at least one selected from the group consisting of the following compounds:
A pattern forming process comprising the steps of applying a resist composition onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, baking, and immersing in an alkaline developer to form a positive pattern wherein the exposed region of resist film is dissolved away, but not the unexposed region,
- the resist composition comprising a polymer comprising recurring units having a carboxyl group substituted with an acid labile group and an acid generator, or a polymer comprising recurring units having a carboxyl group substituted with an acid labile group and recurring units capable of generating acid upon exposure, a sulfonium or iodonium salt of fluoroalkanesulfonamide, and an organic solvent,
- the sulfonium or iodonium salt of fluoroalkanesulfonamide being at least one selected from the group consisting of the following compounds:
Dependencies are inferred from the claim text.