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US 2016/0137874 A1Published application
Photoresist overcoat compositions and methods of forming electronic devices
AssigneeRohm and Haas Electronic Materials LLC
InventorsYoung Cheol BAE, Rosemary BELL, Jong Keun PARK, Seung-Hyun LEE
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Abstract
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Claims17
A photoresist overcoat composition, comprising:
- a polymer comprising as polymerized units a monomer of the following general formula (I):
- wherein:
- R1 is chosen from hydrogen and substituted or unsubstituted C1 to C3 alkyl;
- R2 is chosen from C4 to C8 alkyl;
- X is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- and Z is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- wherein the polymer is free of silicon and fluorine;
- an organic solvent;
- and
- a basic quencher;
- wherein the photoresist overcoat composition is free of acid generator compounds.
8 more elements
4-7. (canceled)
A photoresist overcoat composition, comprising:
- a polymer comprising as polymerized units a monomer of the following general formula (I):
- wherein:
- R1 is chosen from hydrogen and substituted or unsubstituted C1 to C3 alkyl;
- R2 is chosen from substituted and unsubstituted C1 to C15 alkyl;
- X is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- and Z is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- wherein the polymer is free of silicon and fluorine;
- an organic solvent;
- and
- a basic quencher chosen from linear and cyclic amides and derivatives thereof;
- aromatic amines and cyclic aliphatic amines.
- wherein the photoresist overcoat composition is free of acid generator compounds.
9 more elements
A photoresist overcoat composition, comprising:
- a polymer comprising as polymerized units a monomer of the following general formula (I):
- wherein:
- R1 is chosen from hydrogen and substituted or unsubstituted C1 to C3 alkyl;
- R2 is chosen from substituted and unsubstituted C1 to C15 alkyl;
- X is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- and Z is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- wherein the polymer is free of silicon and fluorine;
- an organic solvent;
- an actinic or contrast dye;
- and
- a basic quencher.
- wherein the photoresist overcoat composition is free of acid generator compounds.
9 more elements
Dependencies are inferred from the claim text.