Y10S 430/122
Sulfur compound containing
Y10S430/122 (Sulfur compound containing) appears on 682 US grants and 386 published applications in this corpus.
Search patents in Y10S- Granted patents
- 682
- Published applications
- 386
- Assignees
- 148
- Inventors
- 992
- Latest grant
- 4 Jun 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 5 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 5 | 0 |
| 1982 | 5 | 0 |
| 1983 | 5 | 0 |
| 1984 | 11 | 0 |
| 1985 | 10 | 0 |
| 1986 | 11 | 0 |
| 1987 | 9 | 0 |
| 1988 | 7 | 0 |
| 1989 | 10 | 0 |
| 1990 | 12 | 0 |
| 1991 | 13 | 0 |
| 1992 | 8 | 0 |
| 1993 | 8 | 0 |
| 1994 | 23 | 0 |
| 1995 | 16 | 0 |
| 1996 | 10 | 0 |
| 1997 | 17 | 0 |
| 1998 | 20 | 0 |
| 1999 | 21 | 0 |
| 2000 | 28 | 0 |
| 2001 | 13 | 10 |
| 2002 | 29 | 37 |
| 2003 | 17 | 37 |
| 2004 | 35 | 32 |
| 2005 | 20 | 43 |
| 2006 | 28 | 16 |
| 2007 | 39 | 36 |
| 2008 | 24 | 43 |
| 2009 | 44 | 44 |
| 2010 | 44 | 22 |
| 2011 | 33 | 19 |
| 2012 | 22 | 21 |
| 2013 | 16 | 22 |
| 2014 | 37 | 4 |
| 2015 | 17 | 0 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Photoacid generators and lithographic resists comprising the same4 Jun 2019US 10,310,375 B2
- Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition28 Mar 2017US 9,606,435 B2Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method12 Jan 2016US 9,233,919 B2Shin-Etsu Chemical Co., Ltd.
- Coating compositions29 Sep 2015US 9,146,467 B2Merck Patent GmbH
- Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern26 May 2015US 9,040,220 B2Tokyo Ohka Kogyo.Co., Ltd.
- Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition4 Dec 2014US 2014/0356790 A1Shin-Etsu Chemical Co., Ltd.
- Photoacid Generators And Lithographic Resists Comprising The Same23 Oct 2014US 2014/0315130 A1The University of North Carolina at Charlotte
- Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method2 Oct 2014US 2014/0296561 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition, method of forming resist pattern, novel compound, and acid generator1 May 2014US 2014/0120472 A1Tokyo Ohka Kogyo.Co., Ltd.
- Positive resist composition for immersion exposure and pattern forming method19 Dec 2013US 2013/0337384 A1FUJIFILM Corporation
Most cited
By later US patents
- Sensitizers for photopolymerization190US 4,308,400 ACiba-Geigy Corporation · 1981
- Bisacylphosphine oxides, the preparation and use thereof183US 4,737,593 AFabrik Pharmazeutischer Praparate · 1988
- Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials165US 4,256,828 AMinnesota Mining and Manufacturing Company · 1981
- (Disulfonyl diazomethane compounds)163US 6,153,733 ADaito Chemix Corporation · 2000
- Fluorone and pyronin y derivatives126US 5,451,343 ASpectra Group Limited, Inc. · 1995