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US 2014/0315130 A1Published application
Photoacid Generators And Lithographic Resists Comprising The Same
AssigneeThe University of North Carolina at Charlotte
InventorsKenneth E. Gonsalves, Mingxing Wang
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Abstract
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
Claims18
1-4. (canceled)
A cationic photoacid generator of Formula (II):
- wherein
- R1 is selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl, —OC(O)-alkyl, —OC(O)-alkenyl, —O-alkylene-O-alkenyl, and —OH;
- R2 is selected from the group consisting of alkylene, cycloalkylene, arylene, heteroarylene and polycyclic;
- R3, R4, R5 and R6 are independently selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-heteroaryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl;
- wherein the alkyl, alkenyl, alkynl, cycloalkyl, aryl, and heteroaryl of R1 and R3-R6 are optionally and independently substituted one or more times with a substituent selected from the group consisting of -alkyl, -alkenyl, -alkynyl, cycloalkyl, -aryl, heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, -carboxyl, -hydroxyl, -halo, and -nitro;
- and
- X− is selected from the group consisting of CF3SO3−, C4F9SO3− and an anionic photoacid generator of Formula (I) wherein the counter cation is not present.
4 more elements
An acid amplifier of Formula (III):
- wherein
- R1, R2, R3, R4, R5, R6, R7, R8, R9, R10 and R12 are independently selected from the group consisting of
- -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -fluoroalkyl, -fluoroalkenyl, -fluoroalkynyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl, —OC(O)-alkyl, —OC(O)-alkenyl, -carboxyl, -hydroxyl, -halo, -cyano and -nitro,
- wherein the alkyl, alkenyl, alkynyl, cycloalkyl, aryl and heteroaryl groups of R1-R8 are optionally and independently substituted one of more times with a substituent selected from the group consisting of -alkyl, -alkenyl, -fluoroalkyl, -fluoroalkyl, -aryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —OC(O)-alkyl, —OC(O)-alkenyl, -carboxyl, -hydroxyl, -halo, and -nitro.
1 more element
A lithographic resist comprising a photoacid generator of Formula (I) or Formula (II) or combinations thereof.
(canceled)
(canceled)
Dependencies are inferred from the claim text.