Y10S 430/123
Sulfur in heterocyclic ring
Y10S430/123 (Sulfur in heterocyclic ring) appears on 239 US grants and 137 published applications in this corpus.
Search patents in Y10S- Granted patents
- 239
- Published applications
- 137
- Assignees
- 83
- Inventors
- 418
- Latest grant
- 4 Jun 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 9 | 0 |
| 1985 | 5 | 0 |
| 1986 | 9 | 0 |
| 1987 | 6 | 0 |
| 1988 | 3 | 0 |
| 1989 | 4 | 0 |
| 1990 | 6 | 0 |
| 1991 | 8 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 3 | 0 |
| 1995 | 6 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 5 | 0 |
| 2000 | 8 | 0 |
| 2001 | 3 | 0 |
| 2002 | 1 | 7 |
| 2003 | 3 | 9 |
| 2004 | 5 | 8 |
| 2005 | 6 | 9 |
| 2006 | 6 | 4 |
| 2007 | 8 | 10 |
| 2008 | 7 | 20 |
| 2009 | 23 | 21 |
| 2010 | 19 | 10 |
| 2011 | 12 | 9 |
| 2012 | 7 | 13 |
| 2013 | 8 | 15 |
| 2014 | 25 | 2 |
| 2015 | 8 | 0 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Photoacid generators and lithographic resists comprising the same4 Jun 2019US 10,310,375 B2
- Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition28 Mar 2017US 9,606,435 B2Shin-Etsu Chemical Co., Ltd.
- Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern26 May 2015US 9,040,220 B2Tokyo Ohka Kogyo.Co., Ltd.
- Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern19 May 2015US 9,034,556 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and method of forming resist pattern12 May 2015US 9,029,070 B2Tokyo Ohka Kogyo.Co., Ltd.
- Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition4 Dec 2014US 2014/0356790 A1Shin-Etsu Chemical Co., Ltd.
- Photoacid Generators And Lithographic Resists Comprising The Same23 Oct 2014US 2014/0315130 A1The University of North Carolina at Charlotte
- Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same15 Aug 2013US 2013/0209938 A1Central Glass Company, Limited
- Resist composition and method of forming resist pattern9 May 2013US 2013/0115555 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and method for producing resist pattern24 Jan 2013US 2013/0022917 A1Sumitomo Chemical Company, Limited
Most cited
By later US patents
- Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines112US 3,954,475 AMinnesota Mining and Manufacturing Company · 1976
- Composition for photo imaging96US 5,026,624 AInternational Business Machines Corporation · 1991
- Photocurable compositions83US 4,442,197 AGeneral Electric Company · 1984
- Photopolymerizable composition containing a certain xanthene or thioxanthene dyestuff73US 4,766,055 ANippon Paint Co., Ltd. · 1988
- Radiation sensitive plates65US 5,130,227 AVickers, Incorporated · 1992