Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYoshinori HIRANO, Hideyoshi YANAGISAWA
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Abstract
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.
Claims7
A sacrificial film pattern having a sidewall which is forward tapered at an angle from 85° to less than 90° relative to the substrate, and formed from a positive novolac resist composition comprising
- (A-1) (i) a cresol novolac resin having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonic acid halide, or (ii) a mixture of a cresol novolac resin having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonic acid halide and a cresol novolac resin having phenolic hydroxyl groups non-esterified, (A-2) the novolac resin (i) or novolac resin mixture (ii) as component (A-1) and a 1,2-naphthoquinonediazidosulfonic acid ester, or (A-3) a cresol novolac resin having phenolic hydroxyl groups non-esterified and a 1,2-naphthoquinonediazidosulfonic acid ester,
- a crosslinker capable of forming crosslinks within the cresol novolac resin in the presence of an acid catalyst, and
- a photoacid generator having the highest absorption peak in the wavelength range of 200 to 300 nm, through developing with an alkaline developer.
Dependencies are inferred from the claim text.