Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYoshinori Hirano, Hideyoshi Yanagisawa
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Abstract
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.
Claims10
A sacrificial film pattern having a sidewall which is forward tapered at an angle from 85° to less than 90° relative to the substrate, and formed from a positive novolac resist composition comprising
- (A-1) (i) a cresol novolac resin consisting of at least 40 mol % of p-cresol and the remainder of m-cresol and having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonic acid halide, or (ii) a mixture of a cresol novolac resin consisting of at least 40 mol % of p-cresol and the remainder of m-cresol and having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonic acid halide and a cresol novolac resin having phenolic hydroxyl groups non-esterified,
- a crosslinker capable of forming crosslinks within the cresol novolac resin in the presence of an acid catalyst, and
- a photoacid generator having the highest absorption peak in the wavelength range of 200 to 300 nm and selected from the group consisting of sulfonium salts, iodonium salts, sulfonyldiazomethane and N-sulfonyloxyimide compounds.
A sacrificial film pattern having a sidewall which is forward tapered at an angle from 85° to less than 90° relative to the substrate, and formed from a positive novolac resist composition consisting essentially of
- 70 to less than 98% by weight of (A-1) (i) a cresol novolac resin consisting of at least 40 mol % of p-cresol and the remainder of m-cresol and having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonic acid halide,
- 2 to 25% by weight of a crosslinker capable of forming crosslinks within the cresol novolac resin in the presence of an acid catalyst,
- 0.001 to 15% by weight of a photoacid generator having the highest absorption peak in the wavelength range of 200 to 300 nm and selected from the group consisting of sulfonium salts, iodonium salts, sulfonyldiazomethane and N-sulfonyloxyimide compounds, and
- 0 to 0.5% by weight of a surfactant.
A sacrificial film pattern having a sidewall which is forward tapered at an angle from 85° to less than 90° relative to the substrate, and formed from a positive novolac resist composition consisting essentially of
- 70 to less than 98% by weight of (A-1) (i) a cresol novolac resin consisting of at least 40 mol % of p-cresol and the remainder of m-cresol and having some or all phenolic hydroxyl groups esterified with 1,2-naphthoquinonediazidosulfonic acid halide,
- 2 to 25% by weight of a crosslinker capable of forming crosslinks within the cresol novolac resin in the presence of an acid catalyst,
- 0.001 to 15% by weight of a photoacid generator having the highest absorption peak in the wavelength range of 200 to 300 nm and selected from the group consisting of sulfonium salts, iodonium salts, sulfonyldiazomethane and N-sulfonyloxyimide compounds, and
- 0 to 0.5% by weight of a surfactant,
- wherein the cresol novolac resin in (A-1) has a weight average molecular weight of 2,000 to 30,000 and a melting temperature of at least 130° C., and
- the cresol novolac resin having some or all phenolic hydroxyl groups esterified with 1,2-naphthaoquinonediazidosulfonic acid halide is a cresol novolac resin in which 0.5 to 30 mol % of phenolic hydroxyl groups are esterified with 1,2-naphthoquinonediazidosulfonic acid halide, and
- wherein said crosslinker is a melamine compound and the composition comprises 2 to 30% by weight of the melamine compound based on the total solids weight of the composition.
Dependencies are inferred from the claim text.