Y10S 430/118
With inhibitor or stabilizer
Official title: with inhibitor or stabilizer
Y10S430/118 (With inhibitor or stabilizer) appears on 119 US grants and 30 published applications in this corpus.
Search patents in Y10S- Granted patents
- 119
- Published applications
- 30
- Assignees
- 59
- Inventors
- 299
- Latest grant
- 11 Nov 2014
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 5 | 0 |
| 1978 | 2 | 0 |
| 1979 | 5 | 0 |
| 1980 | 4 | 0 |
| 1981 | 9 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 4 | 0 |
| 1987 | 4 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 6 | 0 |
| 1991 | 6 | 0 |
| 1992 | 4 | 0 |
| 1993 | 6 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 7 | 2 |
| 2002 | 1 | 3 |
| 2003 | 1 | 5 |
| 2004 | 2 | 2 |
| 2005 | 7 | 2 |
| 2006 | 2 | 7 |
| 2007 | 5 | 4 |
| 2008 | 2 | 2 |
| 2009 | 5 | 1 |
| 2010 | 1 | 1 |
| 2011 | 2 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Method for forming pattern11 Nov 2014US 8,883,023 B2Jsr Corporation
- Electromagnetic radiation or thermally sensitive composition15 May 2012US 8,178,277 B2Datalase Ltd.
- Positive photosensitive composition12 Jul 2011US 7,977,029 B2FUJIFILM Corporation
- Resist composition for electron beam or EUV1 Feb 2011US 7,879,528 B2Tokyo Ohka Kogyo.Co., Ltd.
- Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same11 May 2010US 7,713,677 B2Samsung Electronics Co., Ltd.
- Method for forming pattern25 Apr 2013US 2013/0098870 A1Jsr Corporation
- Electromagnetic radiation or thermally sensitive composition29 Apr 2010US 2010/0104825 A1Datalase Ltd.
- Barrier film material and pattern formation method using the same10 Sep 2009US 2009/0227111 A1Panasonic Corporation
- Positive photosensitive composition25 Dec 2008US 2008/0318159 A1FUJIFILM Corporation
- Resist composition for electron beam or euv24 Jul 2008US 2008/0176170 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same101US 4,954,414 AThe Mead Corporation · 1990
- Method of repairing teeth using a composition which is curable by irradiation with visible light75US 4,089,763 AImperial Chemical Industries PLC · 1978
- Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor74US 4,269,933 AE. I. Du Pont de Nemours and Company · 1981
- Positive photosensitive composition74US 5,945,250 AFuji Photo Film Co., Ltd. · 1999
- Photosensitive resin composition for flexographic printing plates69US 4,045,231 ATokyo Ohka Kogyo Co., Ltd. · 1977