Y10S 430/119
Hydroxyl or carbonyl group containing as sole functional groups
Y10S430/119 (Hydroxyl or carbonyl group containing as sole functional groups) appears on 38 US grants and 10 published applications in this corpus.
Search patents in Y10S- Granted patents
- 38
- Published applications
- 10
- Assignees
- 30
- Inventors
- 111
- Latest grant
- 15 May 2012
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 4 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 1 |
| 2002 | 0 | 1 |
| 2003 | 0 | 2 |
| 2004 | 1 | 0 |
| 2005 | 2 | 1 |
| 2006 | 1 | 2 |
| 2007 | 2 | 1 |
| 2008 | 0 | 0 |
| 2009 | 2 | 1 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Electromagnetic radiation or thermally sensitive composition15 May 2012US 8,178,277 B2Datalase Ltd.
- Barrier film material and pattern formation method using the same23 Jun 2009US 7,550,253 B2Panasonic Corporation
- Negative radiation-sensitive resin composition27 Jan 2009US 7,482,111 B2Jsr Corporation
- Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator26 Jun 2007US 7,235,349 B2Hynix Semiconductor Inc.
- Positive working thermal plates12 Jun 2007US 7,229,739 B2Anocoil Corporation
- Electromagnetic radiation or thermally sensitive composition29 Apr 2010US 2010/0104825 A1Datalase Ltd.
- Barrier film material and pattern formation method using the same10 Sep 2009US 2009/0227111 A1Panasonic Corporation
- Negative radiation-sensitive resin composition16 Aug 2007US 2007/0190450 A1Jsr Corporation
- Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator17 Aug 2006US 2006/0183050 A1Hynix Semiconductor Inc.
- Positive working thermal plates15 Jun 2006US 2006/0127802 A1Anocoil Corporation
Most cited
By later US patents
- Method of repairing teeth using a composition which is curable by irradiation with visible light75US 4,089,763 AImperial Chemical Industries PLC · 1978
- Speed enhancers for acid sensitized resists27US 5,164,278 AInternational Business Machines Corporation · 1992
- Dual UV/thermally curable acrylate compositions with pinacol23US 4,288,527 AW. R. Grace & Co. · 1981
- Radiation sensitive composition22US 6,255,034 B1Jsr Corporation · 2001
- Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate18US 5,773,194 AKonica Corporation · 1998