Barrier film material and pattern formation method using the same
AssigneePanasonic Corporation
InventorsMasayuki Endo, Masaru Sasago
Life of this patent
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Abstract
A resist film made of a chemically amplified resist is formed on a substrate. Subsequently, a barrier film for preventing a component of the resist film from eluting into an immersion liquid or preventing the immersion liquid from permeating into the resist film is formed on the resist film. Thereafter, with an immersion liquid provided on the barrier film, pattern exposure is carried out by selectively irradiating the resist film with exposing light through the barrier film. Then, after removing the barrier film, the resist film having been subjected to the pattern exposure is developed, so as to form a resist pattern made of the resist film.
Claims44
A pattern formation method comprising the steps of:
- forming a resist film made of a chemically amplified resist on a substrate;
- forming a barrier film on said resist film;
- performing pattern exposure by selectively irradiating said resist film with exposing light with a liquid provided on said barrier film;
- removing said barrier film;
- and
- forming a resist pattern made of said resist film by developing said resist film after removing said barrier film,
- wherein said barrier film includes an alkali-soluble polymer and a fluorine-based surface active agent, and
- said barrier film prevents a component of said resist film from eluting into said liquid or prevents said liquid from permeating into said resist film.
A pattern formation method comprising the steps of:
- forming a resist film made of a chemically amplified resist on a substrate;
- forming a barrier film on said resist film;
- performing pattern exposure by selectively irradiating said resist film with exposing light with a liquid provided on said barrier film;
- and
- removing said barrier film and forming a resist pattern made of said resist film by developing said resist film after the pattern exposure,
- wherein said barrier film includes an alkali-soluble polymer and a fluorine-based surface active agent, and
- said barrier film prevents a component of said resist film from eluting into said liquid or prevents said liquid from permeating into said resist film.
Dependencies are inferred from the claim text.