Barrier film material and pattern formation method using the same
AssigneePanasonic Corporation
InventorsMasayuki Endo, Masaru Sasago
Life of this patent
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Abstract
A resist film made of a chemically amplified resist is formed on a substrate. Subsequently, a barrier film for preventing a component of the resist film from eluting into an immersion liquid or preventing the immersion liquid from permeating into the resist film is formed on the resist film. Thereafter, with an immersion liquid provided on the barrier film, pattern exposure is carried out by selectively irradiating the resist film with exposing light through the barrier film. Then, after removing the barrier film, the resist film having been subjected to the pattern exposure is developed, so as to form a resist pattern made of the resist film.
Claims19
1-52. (canceled)
A pattern formation method comprising:
- forming a resist film made of a chemically amplified resist material on a substrate;
- forming a barrier film on the resist film;
- performing pattern exposure by selectively irradiating the resist film with exposing light with water provided on the barrier film;
- and
- forming a resist pattern by developing the resist film after the pattern exposure,
- wherein the barrier film is made of a barrier film material including an alkali-soluble polymer and an alcohol solvent.
A method of fabricating a semiconductor device, the method comprising:
- forming a target film on a substrate;
- forming a resist film made of a chemically amplified resist material on the target film;
- forming a barrier film on the resist film;
- performing pattern exposure by selectively irradiating the resist film with exposing light with water provided on the barrier film;
- forming a resist pattern by developing the resist film after the pattern exposure;
- and
- etching the target film by using the resist pattern as an etching mask,
- wherein the barrier film is made of a barrier film material including an alkali-soluble polymer and an alcohol solvent.
Dependencies are inferred from the claim text.