Speed enhancers for acid sensitized resists

An acid initiated photoresist composition comprising from 1 to 5 weight percent of an acid generating photoinitiator, from 15 to 25 weight percent of a polymer binder or matrix, an acid sensitive group which enables patterning of the composition by an acid initiated chemical reaction, from 1 to 5 weight percent of a hydroxy aromatic compound selected from the group consisting of hydroquinone, pyrogallol, 4-hydroxyacetophenone, Bisphenol A, and 3,5-di-t-butyl-4-cresol which is sufficient to enhance the photospeed of the resist composition under imaging radiation, and an organic solvent for the photoresist solids.

A positive working acid initiated photoresist composition comprising from 1 to 5 weight percent of an acid generating photoinitiator, from 15 to 25 weight percent of a polymeric binder or matrix, an acid sensitive group which enables patterning of the composition by an acid initiated chemical reaction, from 1 to 5 weight percent of a hydroxyaromatic compound of the form ##STR7## where X is an OH group and m is an integer equal to one or more, Y is an alkyl, aryl, alkoxy, halo, or acetyl group and q is an integer equal to one or more, and Z is --O--, --S--, --C.sub.n H.sub.2n --, or --C.sub.n F.sub.2n -- where n is an integer from 1-12, which is sufficient to enhance the photospeed of the resist composition under imaging radiation, and an organic solvent for the photoresist solids.