Positive photosensitive composition

A positive photosensitive composition comprising

• (1) a resin having groups which decompose by the action of an acid to enhance solubility of the resin in an alkaline developing solution and
• (2) a resin which generates a sulfonic acid upon irradiation with actinic rays or a radiation and has at least one kind of repeating structural units represented by formulae (I) or (III):
• ##STR30## wherein R.sub.1 to R.sub.3 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group which may have substituents(s), a cycloalkyl group which may have substituent(s), an alkoxy group which may have substituent(s), or a group represented by --S--R.sub.6, wherein R.sub.6 represents an alkyl group which may have substituent(s) or an aryl group which may have substituent(s);
• R.sub.7 and R.sub.11 each independently represents a hydrogen atom, a halogen atom, a cyano group, or an alkyl group which may have substituent(s);
• R.sub.8 to R.sub.10 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group, a carboxyl group, an alkyl group which may have substituent(s), an aralkyl group which may have substituent(s) or an alkoxy group which may have substituent(s);
• A represents --O-- or a group represented by --NR.sub.12 --, wherein R.sub.12 represents a hydrogen atom or an alkyl group which may have substituent(s) or an aryl group which may have substituent(s);
• and B represents an alkylene group which may have substituent(s) or an arylene group which may have substituent(s).

A positive photosensitive composition comprising:

• a resin which generates a sulfonic acid upon irradiation with actinic rays or a radiation and has at least one kind of repeating structural units represented by formulae (I) or (III):
• ##STR31## wherein R.sub.1 to R.sub.3 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group which may have substituent(s), a cycloalkyl group which may have substituent(s), an alkoxy group which may have substituent(s), or a group represented by --S--R.sub.6, wherein R.sub.6 represents an alkvl group which may have substituent(s) or an aryl group which may have substituent(s);
• R.sub.7 and R.sub.11 each independently represents a hydrogen atom, a halogen atom, a cyano group, or an alkyl group which may have substituent(s);
• R.sub.8 to R.sub.10 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group a carboxyl group, an alkyl group which may have substituent(s), an aralkyl group which may have substituent(s) or an alkoxy group which may have substituent(s);
• A represents --O-- or a group represented by --NR.sub.12 --, wherein R.sub.12 represents a hydrogen atom or an alkyl group which may have substituent(s) or an aryl group which may have substituent(s);
• and B represents an alkylene group which may have substituent(s) or an arylene group which may have substituent(s);
• a low-molecular acid-decomposable dissolution inhibitive compound having a molecular weight of 3,000 or lower and having groups decomposable by an acid, which enhances solubility of the dissolution inhibitive compound in an alkaline developing solution by the action of an acid;
• and
• a resin insoluble in water and soluble in an aqueous alkali solution.