Y10S 430/115
Cationic or anionic
Y10S430/115 (Cationic or anionic) appears on 642 US grants and 355 published applications in this corpus.
Search patents in Y10S- Granted patents
- 642
- Published applications
- 355
- Assignees
- 133
- Inventors
- 983
- Latest grant
- 10 May 2016
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 8 | 0 |
| 1978 | 6 | 0 |
| 1979 | 8 | 0 |
| 1980 | 1 | 0 |
| 1981 | 11 | 0 |
| 1982 | 0 | 0 |
| 1983 | 5 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 8 | 0 |
| 1989 | 12 | 0 |
| 1990 | 15 | 0 |
| 1991 | 16 | 0 |
| 1992 | 13 | 0 |
| 1993 | 6 | 0 |
| 1994 | 21 | 0 |
| 1995 | 10 | 0 |
| 1996 | 5 | 0 |
| 1997 | 8 | 0 |
| 1998 | 10 | 0 |
| 1999 | 13 | 0 |
| 2000 | 28 | 0 |
| 2001 | 33 | 19 |
| 2002 | 42 | 52 |
| 2003 | 33 | 55 |
| 2004 | 58 | 51 |
| 2005 | 41 | 44 |
| 2006 | 35 | 24 |
| 2007 | 46 | 31 |
| 2008 | 24 | 21 |
| 2009 | 27 | 32 |
| 2010 | 25 | 11 |
| 2011 | 23 | 1 |
| 2012 | 18 | 5 |
| 2013 | 3 | 6 |
| 2014 | 4 | 2 |
| 2015 | 10 | 1 |
| 2016 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Pattern-forming method, and radiation-sensitive composition10 May 2016US 9,335,630 B2Jsr Corporation
- Pattern-forming method, and radiation-sensitive composition29 Mar 2016US 9,298,090 B2Jsr Corporation
- Coating compositions29 Sep 2015US 9,146,467 B2Merck Patent GmbH
- Resist composition, method of forming resist pattern and compound26 May 2015US 9,040,224 B2Tokyo Ohka Kogyo.Co., Ltd.
- Pattern-forming method, and radiation-sensitive composition19 May 2015US 9,034,559 B2Jsr Corporation
- Pattern-forming method, and radiation-sensitive composition25 Jun 2015US 2015/0177616 A1Jsr Corporation
- Resist composition, method of forming resist pattern, polymeric compound and compound11 Sep 2014US 2014/0255853 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern and compound26 Jun 2014US 2014/0178821 A1Tokyo Ohka Kogyo.Co., Ltd.
- Coating compositions12 Sep 2013US 2013/0236833 A1AZ Electronic Materials USA Corp.
- Pattern-forming method, and radiation-sensitive composition5 Sep 2013US 2013/0230804 A1Jsr Corporation
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist471US 6,811,960 B2Hyundai Electronics Industries Co., Ltd. · 2004
- Energy curable compositions: two component curing agents227US 4,985,340 AMinnesota Mining and Manufacturing Company · 1991
- Cationically polymerizable compositions containing group VIa onium salts166US 4,058,400 AGeneral Electric Company · 1977