Resist composition, method of forming resist pattern and compound

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, comprising:

• a base component (A) which exhibits changed solubility in a developing solution under action of acid;
• an acid generator component (B) comprising a compound represented by general formula (b-1) shown below:
• wherein the R101—Y101—V101—CR102F—SO3− in the general formula (b-1) is at least one anion moiety represented by any one of formulae (an-1) to (an-3) shown below:
• wherein M′m+ re resents an organic cation having a valency of m:
• R″101 represents an aliphatic cyclic group which may have a substituent, a group represented by any one of formulae (r-hr-1) to (r-hr-6) shown below or a chain-like alkyl group which may have a substituent;
• R″102 represents an aliphatic cyclic group which may have a substituent, a lactone-containing cyclic got represented by any one of formulae (a2-r-1) to (a2-r-7) shown below or an —SO2— containing cyclic group represented by an one of formulae (a5-r-1) to (a5-r-4) shown below;
• R″103 represents an aromatic cyclic group which may have a substituent, an aliphatic cyclic group which may have a substituent or a chain-like alkenyl group which ma have a substituent V″101 represents a fluorinated alkylene group;
• L″101 represents —C(═O)— or —SO2—;
• v″ each independently represents an integer of 0 to 3;
• q″ each independently represents an integer of 1 to 20;
• and n″ represents 0 or 1:
• wherein * represents a valence bond:
• wherein each Ra′21 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″—OC(═O)R″, a hydroxyalkyl group or a cyano group;
• R″ represents a hydrogen atom or an alkyl group;
• A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom;
• n′ represents an integer of 0 to 2;
• m′ represents 0 or 1;
• and * represents a valence bond:
• wherein each Ra′51 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group;
• R″ represents a hydrogen atom or an alkyl group;
• A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom;
• n′ represents an integer of 0 to 2;
• and * represents a valence bond;
• and
• a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below:
• wherein R1 represents a cyclic aliphatic hydrocarbon group represented by any one of formulae (r-lc-1-1) to (r-lc-1-2), (r-lc-2-1), (r-lc-2-7), (r-lc-6-1), (r-lc-7-1), (r-sl-1-1) and (r-sl-1-18) shown below:
• Y1 represents a single bond or a divalent linking group;
• R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom;
• one of R2 and R3 may form a ring with Y′;
• Mm+ represents an organic cation having a valency of m;
• and m represents an integer of 1 or more.