Y10S 430/12
Nitrogen compound containing
Y10S430/12 (Nitrogen compound containing) appears on 690 US grants and 213 published applications in this corpus.
Search patents in Y10S- Granted patents
- 690
- Published applications
- 213
- Assignees
- 164
- Inventors
- 1,113
- Latest grant
- 4 Jun 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 11 | 0 |
| 1977 | 9 | 0 |
| 1978 | 9 | 0 |
| 1979 | 3 | 0 |
| 1980 | 5 | 0 |
| 1981 | 23 | 0 |
| 1982 | 14 | 0 |
| 1983 | 15 | 0 |
| 1984 | 13 | 0 |
| 1985 | 17 | 0 |
| 1986 | 18 | 0 |
| 1987 | 12 | 0 |
| 1988 | 21 | 0 |
| 1989 | 16 | 0 |
| 1990 | 24 | 0 |
| 1991 | 23 | 0 |
| 1992 | 15 | 0 |
| 1993 | 21 | 0 |
| 1994 | 27 | 0 |
| 1995 | 10 | 0 |
| 1996 | 21 | 0 |
| 1997 | 21 | 0 |
| 1998 | 29 | 0 |
| 1999 | 35 | 0 |
| 2000 | 35 | 0 |
| 2001 | 13 | 6 |
| 2002 | 13 | 13 |
| 2003 | 14 | 14 |
| 2004 | 16 | 23 |
| 2005 | 12 | 17 |
| 2006 | 11 | 10 |
| 2007 | 17 | 19 |
| 2008 | 18 | 19 |
| 2009 | 18 | 30 |
| 2010 | 20 | 14 |
| 2011 | 23 | 8 |
| 2012 | 22 | 17 |
| 2013 | 9 | 18 |
| 2014 | 23 | 3 |
| 2015 | 11 | 1 |
| 2016 | 2 | 1 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Photoacid generators and lithographic resists comprising the same4 Jun 2019US 10,310,375 B2
- Photoresist overcoat compositions and methods of forming electronic devices4 Oct 2016US 9,458,348 B2Rohm and Haas Electronic Materials LLC
- Exposure photolithography methods12 Jan 2016US 9,235,119 B2Globalfoundries Inc.
- Photoresist overcoat compositions and methods of forming electronic devices15 Dec 2015US 9,212,293 B2Rohm and Haas Electronic Materials LLC
- Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern26 May 2015US 9,040,220 B2Tokyo Ohka Kogyo.Co., Ltd.
- Photoresist overcoat compositions and methods of forming electronic devices19 May 2016US 2016/0137874 A1Rohm and Haas Electronic Materials LLC
- Photoresist overcoat compositions and methods of forming electronic devices11 Jun 2015US 2015/0159038 A1Rohm and Haas Electronic Materials LLC
- Exposure photolithography methods27 Nov 2014US 2014/0349237 A1International Business Machines Corporation
- Photoacid Generators And Lithographic Resists Comprising The Same23 Oct 2014US 2014/0315130 A1The University of North Carolina at Charlotte
- Resist composition, method of forming resist pattern, novel compound, and acid generator1 May 2014US 2014/0120472 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Ternary photoinitiator system for addition polymerization289US 5,545,676 AMinnesota Mining and Manufacturing Company · 1996
- Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine226US 4,330,590 AMinnesota Mining and Manufacturing Company · 1982
- Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine197US 4,329,384 AMinnesota Mining and Manufacturing Company · 1982
- Sensitizers for photopolymerization190US 4,308,400 ACiba-Geigy Corporation · 1981
- (Disulfonyl diazomethane compounds)163US 6,153,733 ADaito Chemix Corporation · 2000