Y10S 430/121
Nitrogen in heterocyclic ring
Y10S430/121 (Nitrogen in heterocyclic ring) appears on 440 US grants and 119 published applications in this corpus.
Search patents in Y10S- Granted patents
- 440
- Published applications
- 119
- Assignees
- 113
- Inventors
- 731
- Latest grant
- 12 May 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 5 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 13 | 0 |
| 1982 | 12 | 0 |
| 1983 | 8 | 0 |
| 1984 | 7 | 0 |
| 1985 | 10 | 0 |
| 1986 | 9 | 0 |
| 1987 | 8 | 0 |
| 1988 | 18 | 0 |
| 1989 | 12 | 0 |
| 1990 | 18 | 0 |
| 1991 | 19 | 0 |
| 1992 | 11 | 0 |
| 1993 | 18 | 0 |
| 1994 | 21 | 0 |
| 1995 | 6 | 0 |
| 1996 | 16 | 0 |
| 1997 | 16 | 0 |
| 1998 | 20 | 0 |
| 1999 | 25 | 0 |
| 2000 | 22 | 0 |
| 2001 | 8 | 4 |
| 2002 | 6 | 9 |
| 2003 | 12 | 10 |
| 2004 | 6 | 11 |
| 2005 | 9 | 11 |
| 2006 | 5 | 6 |
| 2007 | 9 | 10 |
| 2008 | 10 | 10 |
| 2009 | 12 | 16 |
| 2010 | 15 | 8 |
| 2011 | 12 | 2 |
| 2012 | 9 | 7 |
| 2013 | 6 | 15 |
| 2014 | 14 | 0 |
| 2015 | 4 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Resist composition and method of forming resist pattern12 May 2015US 9,029,070 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern, polymeric compound, and compound5 May 2015US 9,023,581 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and method of forming resist pattern5 May 2015US 9,023,585 B2Tokyo Ohka Kogyo.Co., Ltd.
- Photoacid generators13 Jan 2015US 8,932,797 B2Dow Global Technologies LLC
- Salt, resist composition and method for producing resist pattern30 Dec 2014US 8,921,028 B2Sumitomo Chemical Company, Limited
- Resist composition and method of forming resist pattern26 Dec 2013US 2013/0344436 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and method of forming resist pattern9 May 2013US 2013/0115555 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern, polymeric compound, and compound11 Apr 2013US 2013/0089819 A1Tokyo Ohka Kogyo.Co., Ltd.
- Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same17 Jan 2013US 2013/0017489 A1International Business Machines Corporation
- Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same17 Jan 2013US 2013/0017490 A1International Business Machines Corporation
Most cited
By later US patents
- Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine226US 4,330,590 AMinnesota Mining and Manufacturing Company · 1982
- Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine197US 4,329,384 AMinnesota Mining and Manufacturing Company · 1982
- Sensitizers for photopolymerization190US 4,308,400 ACiba-Geigy Corporation · 1981
- Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates129US 5,340,699 AEastman Kodak Company · 1994
- Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions124US 4,162,162 AE. I. Du Pont de Nemours and Company · 1979