Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTsuyoshi Nakamura, Jiro Yokoya, Hideto Nito, Hiroaki Shimizu
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Abstract
A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, and the resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) including a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) including a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5.
Claims15
A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid,
- the resist composition comprising:
- a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid;
- an acidic compound component (G1) comprising a nitrogen-containing cation having a pKa value of 7 or less and a counteranion;
- and
- a buffer component (K) comprising a nitrogen-containing cation and a counteranion being a conjugate base for an acid having a pKa value of 0 to 5.
Dependencies are inferred from the claim text.