Resist composition, method of forming resist pattern, polymeric compound, and compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsAkiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
Life of this patent
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Abstract
A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
Claims14
A resist composition which exhibits changed solubility in an alkali developing solution upon exposure, comprising:
- a polymeric compound (A) having a structural unit (a0) represented by general formula (a0) shown below:
- wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms;
- R1 represents a divalent aromatic cyclic group;
- each of R2 and R3 independently represents an aryl group which may have a substituent, an alkyl group which may have a substituent or an alkenyl group which may have a substituent, wherein R2 and R3 may be mutually bonded to form a ring with the sulfur atom;
- L1 represents a single bond or a divalent linking group;
- and A represents an anion represented by general formula (1) or (2) shown below:
- R5-L2-R4—SO3− (1)
- R7-L3-Y10—N−—SO2—R6 (2)
- wherein in formula (1), R4 represents an alkylene group of 1 to 4 carbon atoms which may have a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent;
- L2 represents a single bond or a divalent linking group;
- and R5 represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent;
- and in formula (2), R6 represents an alky group which may have a substituent or a fluorinated alkyl group which may have a substituent;
- L3 represents a single bond or a divalent linking group;
- Y10 represents a —SO2— or a —CO—;
- and R7 represents a hydrocarbon group which may have a substituent.
A polymeric compound comprising a structural unit (a0) represented by general formula (a0) shown below:
- wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms;
- R1 represents a divalent aromatic cyclic group;
- each of R2 and R3 independently represents an aryl group which may have a substituent, an alkyl group which may have a substituent or an alkenyl group which may have a substituent, wherein R2 and R3 may be mutually bonded to form a ring with the sulfur atom;
- L1 represents a single bond or a divalent linking group;
- and A represents an anion represented by general formula (1) or (2) shown below:
- R5-L2-R4—SO3− (1)
- R7-L3-Y10—N−—SO2—R6 (2)
- wherein in formula (1), R4 represents an alkylene group of 1 to 4 carbon atoms which may have a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent;
- L2 represents a single bond or a divalent linking group;
- and R5 represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent;
- and in formula (2), R6 represents an alky group which may have a substituent or a fluorinated alkyl group which may have a substituent;
- L3 represents a single bond or a divalent linking group;
- Y10 represents a —SO2— or a —CO—;
- and R7 represents a hydrocarbon group which may have a substituent.
A compound represented by general formula (1) shown below:
- wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms;
- R1 represents a divalent aromatic cyclic group;
- each of R2 and R3 independently represents an aryl group which may have a substituent, an alkyl group which may have a substituent or an alkenyl group which may have a substituent, wherein R2 and R3 may be mutually bonded to form a ring with the sulfur atom;
- L1 represents a single bond or a divalent linking group;
- and A represents an anion represented by general formula (1) or (2) shown below:
- R5-L2-R4—SO3− (1)
- R7-L3-Y10—N−—SO2—R6 (2)
- wherein in formula (1), R4 represents an alkylene group of 1 to 4 carbon atoms which may have a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent;
- L2 represents a single bond or a divalent linking group;
- and R5 represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent;
- and in formula (2), R6 represents an alky group which may have a substituent or a fluorinated alkyl group which may have a substituent;
- L3 represents a single bond or a divalent linking group;
- Y10 represents a —SO2— or a —CO—;
- and R7 represents a hydrocarbon group which may have a substituent.
Dependencies are inferred from the claim text.