Back to results
US 9,212,293 B2Granted
Photoresist overcoat compositions and methods of forming electronic devices
AssigneeRohm and Haas Electronic Materials LLC
InventorsYoung Cheol Bae, Rosemary Bell, Jong Keun Park, Seung-Hyun Lee
Life of this patent
Estimating the term…
Abstract
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Claims18
A photoresist overcoat composition, comprising:
- a first polymer comprising as polymerized units a monomer of the following general formula (I):
- wherein:
- R1 is chosen from hydrogen and substituted or unsubstituted C1 to C3 alkyl;
- R2 is chosen from substituted and unsubstituted C1 to C15 alkyl;
- X is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- and Z is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- wherein the first polymer is free of fluorine;
- a second polymer comprising as polymerized units a monomer of the general formula (I);
- an organic solvent;
- and
- a basic quencher.
8 more elements
A photoresist overcoat composition, comprising:
- a first polymer comprising as polymerized units a monomer of the following general formula (I):
- wherein:
- R1 is chosen from hydrogen and substituted or unsubstituted C1 to C3 alkyl;
- R2 is chosen from substituted and unsubstituted C1 to C15 alkyl;
- X is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- and Z is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and substituted and unsubstituted C1 to C10 alkyl;
- a second polymer comprising as polymerized units a monomer of the general formula (I);
- an organic solvent;
- and
- a basic quencher, wherein the basic quencher has a higher surface free energy than the first and second polymers.
7 more elements
Dependencies are inferred from the claim text.