H01J 37/3211
Antennas
Official title: {Antennas, e.g. particular shapes of coils}
H01J37/3211 (Antennas) appears on 577 US grants and 916 published applications in this corpus.
Search patents in H01J- Granted patents
- 577
- Published applications
- 916
- Assignees
- 190
- Inventors
- 1,563
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 4 | 0 |
| 1996 | 5 | 0 |
| 1997 | 4 | 0 |
| 1998 | 4 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 5 | 0 |
| 2002 | 3 | 1 |
| 2003 | 1 | 3 |
| 2004 | 2 | 2 |
| 2005 | 1 | 4 |
| 2006 | 0 | 1 |
| 2007 | 1 | 4 |
| 2008 | 0 | 6 |
| 2009 | 1 | 9 |
| 2010 | 1 | 9 |
| 2011 | 3 | 28 |
| 2012 | 3 | 45 |
| 2013 | 11 | 30 |
| 2014 | 23 | 44 |
| 2015 | 26 | 56 |
| 2016 | 40 | 45 |
| 2017 | 40 | 72 |
| 2018 | 43 | 50 |
| 2019 | 52 | 56 |
| 2020 | 41 | 61 |
| 2021 | 45 | 45 |
| 2022 | 41 | 54 |
| 2023 | 28 | 84 |
| 2024 | 31 | 68 |
| 2025 | 73 | 91 |
| 2026 | 37 | 48 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma processing apparatus6 Oct 2026US 12,755,937 B2Tokyo Electron Limited
- Filter circuit and plasma processing apparatus6 Oct 2026US 12,755,938 B2Tokyo Electron Limited
- Plasma processing apparatus29 Sep 2026US 12,749,650 B2Tokyo Electron Limited
- Sputtering apparatus29 Sep 2026US 12,749,665 B2Samsung Display Co., Ltd.
- Substrate processing apparatus, method of manufacturing semiconductor device and plasma generating apparatus22 Sep 2026US 12,744,182 B2Kokusai Electric Corporation
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
- Metrology Enclosure Including Spectral Reflectometry System for Plasma Processing System Using Direct-Drive Radiofrequency Power Supply1 Oct 2026US 2026/0302144 A1Lam Research Corporation
- Cover and plasma processing apparatus24 Sep 2026US 2026/0290761 A1Tokyo Electron Limited
- Systems and methods for achieving uniformity with multiple coils24 Sep 2026US 2026/0290770 A1Lam Research Corporation
- Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatus17 Sep 2026US 2026/0279726 A1Tokyo Electron Limited
Most cited
By later US patents
- High density plasma deposition and etching apparatus266US 4,990,229 APlasma & Materials Technologies, Inc. · 1991
- Silicon scavenger in an inductively coupled RF plasma reactor249US 5,556,501 AAPPLIED Materials.Inc. · 1996
- High density plasma deposition and etching apparatus208US 5,122,251 APlasma & Materials Technologies, Inc. · 1992
- High density plasma deposition and etching apparatus199US 5,429,070 APlasma & Materials Technologies, Inc. · 1995
- Apparatus for forming film144US 5,620,523 AAlcan-Tech Co., Inc. · 1997