Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorYohei YAMAZAWA
Life of this patent
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Abstract
The present disclosure relates to an antenna for inductively coupled plasma excitation. The antenna comprises: a conductive plate; a plurality of coil assemblies, one end of each of the plurality of coil assemblies being connected to the conductive plate; and an impedance adjusting part disposed between the other end of each of the plurality of coil assemblies and the ground.
Claims22
An antenna for inductively coupled plasma excitation, the antenna comprising:
- a conductive plate;
- a plurality of coil assemblies, one end of each of the plurality of coil assemblies being connected to the conductive plate;
- an impedance adjusting part disposed between an other end of each of the plurality of coil assemblies and ground;
- and
- a conductor plate disposed above the conductive plate,
- wherein a distance between the conductive plate and the conductor plate is shorter than a distance between the conductive plate and the plurality of coil assemblies.
An antenna unit for inductively coupled plasma excitation, the antenna unit comprising:
- a main antenna having a power feed terminal connected to an RF potential;
- a sub-antenna disposed at a position that is inductively coupled or capacitively coupled with the main antenna,
- wherein the sub-antenna includes:
- a conductive plate;
- a plurality of coil assemblies arranged at an outer peripheral portion of the conductive plate and each having one end connected to the conductive plate;
- an impedance adjusting part disposed between an other end of each of the plurality of coil assemblies and ground;
- and
- a conductor plate disposed above the conductive plate,
- wherein a distance between the conductive plate and the conductor plate is shorter than a distance between the conductive plate and the plurality of coil assemblies.
A plasma processing apparatus, comprising:
- a plasma processing chamber;
- a hollow member attached to the plasma processing chamber;
- and
- an antenna that inductively couples plasma excitation that is disposed on or above the plasma processing chamber so as to surround the hollow member,
- wherein the antenna for inductively coupled plasma excitation includes:
- a conductive plate;
- a plurality of coil assemblies each having one end connected to the conductive plate;
- an impedance adjusting part disposed between an other end of each of the plurality of coil assemblies and ground;
- and
- a conductor plate disposed above the conductive plate,
- wherein a distance between the conductive plate and the conductor plate is shorter than a distance between the conductive plate and the plurality of coil assemblies.
An antenna for inductively coupled plasma excitation, the antenna comprising:
- a conductive plate;
- a plurality of coil assemblies, one end of each of the plurality of coil assemblies being connected to the conductive plate;
- a plurality of impedance adjusting parts, each disposed between an other end of each of the plurality of coil assemblies and ground;
- and
- a controller,
- wherein each of the plurality of impedance adjusting parts includes a variable capacitance capacitor, and
- wherein the controller is configured to control to change a capacitance of one or more of the variable capacitance capacitors.
Dependencies are inferred from the claim text.