Apparatus for forming film

A film-forming apparatus for forming a film on a substrate comprising:

• a housing having a central axis and an interior defining an upstream plasma-forming chamber and a downstream film-forming chamber open to said plasma-forming chamber;
• a substrate holder for supporting the substrate within said film-forming chamber;
• means for forming a plasma from a first reaction gas within a plasma-forming zone extending along said central axis within said plasma-forming chamber;
• first gas inlet means for introducing the first reaction gas into an upstream end of said plasma-forming chamber, said first gas inlet means comprising a gas pipe terminating at a distal end within said plasma-forming chamber and having a plurality of gas discharge holes for discharge of the first reaction gas into said plasma-forming chamber and a plate fixed to said distal end and having an upstream surface for receiving the first reaction gas discharged from said gas discharge holes, whereby the first reaction gas is discharged into said plasma-forming zone, flows toward said downstream film forming chamber, then impacts said upstream surface of said plate, then flows over said upstream surface radially outward from said central axis and then exits said plasma-forming chamber and flows into said film-forming chamber;
• second gas inlet means for introducing a second reaction gas into said film-forming chamber for reaction with said first reaction gas to deposit a reaction product as a film on the substrate, said second gas inlet means comprising a plurality of gas discharge pipes, each of said gas discharge pipes having a plurality of gas discharge holes for discharge of the second reaction gas into said film-forming chamber.