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US 2026/0290761 A1Published application
Cover and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorKazushi KANEKO
Life of this patent
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Abstract
A cover that prevents electromagnetic wave leakage from a coil-shaped antenna provided in a plasma processing apparatus, the cover including: a metallic frame body; and a plurality of segments provided on an inner surface of the frame body, wherein the plurality of segments are configured to cover the inner surface with a gap between each of the plurality of segments.
Claims13
A cover that prevents electromagnetic wave leakage from a coil-shaped antenna provided in a plasma processing apparatus, the cover comprising:
- a metallic frame body;
- and
- a plurality of segments provided on an inner surface of the frame body,
- wherein the plurality of segments are configured to cover the inner surface with a gap between each of the plurality of segments.
1 more element
A plasma processing apparatus comprising:
- a processing container configured to have a space for plasma generation;
- a coil-shaped antenna configured to generate electromagnetic waves for plasma excitation to be supplied into the processing container;
- and
- a cover disposed on the processing container to cover the coil-shaped antenna, and configured to include a metallic frame body and a plurality of segments provided on an inner surface of the frame body, to prevent electromagnetic wave leakage from the coil-shaped antenna,
- wherein the plurality of segments are configured to cover the inner surface with a gap between each of the plurality of segments.
2 more elements
Dependencies are inferred from the claim text.