C23C 16/4584
The substrate being rotated
Official title: {the substrate being rotated}
C23C16/4584 (The substrate being rotated) appears on 989 US grants and 1,488 published applications in this corpus.
Search patents in C23C- Granted patents
- 989
- Published applications
- 1,488
- Assignees
- 341
- Inventors
- 2,544
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 5 | 0 |
| 1992 | 2 | 0 |
| 1993 | 5 | 0 |
| 1994 | 10 | 0 |
| 1995 | 8 | 0 |
| 1996 | 10 | 0 |
| 1997 | 7 | 0 |
| 1998 | 8 | 0 |
| 1999 | 8 | 0 |
| 2000 | 15 | 0 |
| 2001 | 20 | 13 |
| 2002 | 16 | 14 |
| 2003 | 13 | 23 |
| 2004 | 9 | 14 |
| 2005 | 13 | 24 |
| 2006 | 4 | 25 |
| 2007 | 6 | 22 |
| 2008 | 7 | 27 |
| 2009 | 4 | 38 |
| 2010 | 11 | 31 |
| 2011 | 17 | 41 |
| 2012 | 16 | 59 |
| 2013 | 17 | 41 |
| 2014 | 24 | 41 |
| 2015 | 39 | 81 |
| 2016 | 35 | 78 |
| 2017 | 43 | 72 |
| 2018 | 41 | 86 |
| 2019 | 66 | 119 |
| 2020 | 80 | 87 |
| 2021 | 66 | 105 |
| 2022 | 81 | 113 |
| 2023 | 63 | 107 |
| 2024 | 74 | 87 |
| 2025 | 86 | 87 |
| 2026 | 53 | 53 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing apparatus and substrate processing method6 Oct 2026US 12,753,501 B2Tokyo Electron Limited
- Heating apparatus and chemical vapor deposition system6 Oct 2026US 12,753,508 B2PlayNitride Display Co., Ltd.
- Atomic layer deposition apparatus29 Sep 2026US 12,747,499 B2Beneq Oy
- Substrate liquid processing apparatus and substrate liquid processing method29 Sep 2026US 12,747,504 B2Tokyo Electron Limited
- Heating apparatus, CVD equipment including the heating apparatus22 Sep 2026US 12,742,241 B2Advanced Micro-Fabrication Equipment Inc. China
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Substrate stage and substrate processing apparatus1 Oct 2026US 2026/0297750 A1Tokyo Electron Limited
- Plasma and Photon assisted Metal-Organic Chemical Vapor Deposition24 Sep 2026US 2026/0286510 A1PhantaField Inc.
- A thin-film deposition apparatus for batch processing24 Sep 2026US 2026/0286515 A1Picosun Oy
- A thin-film deposition apparatus24 Sep 2026US 2026/0286525 A1Picosun Oy
Most cited
By later US patents
- Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween832US 5,781,693 AAPPLIED Materials.Inc. · 1998
- Substrate platform for a semiconductor substrate during rapid high temperature processing and method of supporting a substrate678US 6,090,212 AMicro C Technologies, Inc. · 2000
- Wafer support system670US 6,053,982 AASM America, Inc. · 2000
- Film forming method wherein a partial pressure of a reaction byproduct in a processing container is reduced temporarily625US 5,503,875 ATokyo Electron Limited · 1996
- Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment622US 4,821,674 A1989