C23C 16/4583
The substrate being supported substantially horizontally
Official title: {the substrate being supported substantially horizontally}
C23C16/4583 (The substrate being supported substantially horizontally) appears on 2,844 US grants and 4,161 published applications in this corpus.
Search patents in C23C- Granted patents
- 2,844
- Published applications
- 4,161
- Assignees
- 701
- Inventors
- 6,957
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 3 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 10 | 0 |
| 1992 | 6 | 0 |
| 1993 | 15 | 0 |
| 1994 | 24 | 0 |
| 1995 | 27 | 0 |
| 1996 | 43 | 0 |
| 1997 | 36 | 0 |
| 1998 | 42 | 0 |
| 1999 | 42 | 0 |
| 2000 | 76 | 0 |
| 2001 | 63 | 37 |
| 2002 | 68 | 70 |
| 2003 | 44 | 79 |
| 2004 | 46 | 67 |
| 2005 | 43 | 89 |
| 2006 | 26 | 81 |
| 2007 | 26 | 77 |
| 2008 | 24 | 80 |
| 2009 | 19 | 100 |
| 2010 | 53 | 109 |
| 2011 | 44 | 94 |
| 2012 | 48 | 126 |
| 2013 | 52 | 97 |
| 2014 | 70 | 112 |
| 2015 | 89 | 166 |
| 2016 | 95 | 169 |
| 2017 | 92 | 180 |
| 2018 | 106 | 222 |
| 2019 | 145 | 255 |
| 2020 | 186 | 256 |
| 2021 | 168 | 270 |
| 2022 | 188 | 340 |
| 2023 | 189 | 326 |
| 2024 | 226 | 292 |
| 2025 | 250 | 274 |
| 2026 | 153 | 193 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing of semiconductor manufacturing6 Oct 2026US 12,753,500 B2APPLIED Materials.Inc.
- Substrate processing apparatus and substrate processing method6 Oct 2026US 12,753,501 B2Tokyo Electron Limited
- Substrate processing apparatus6 Oct 2026US 12,753,507 B2Tokyo Electron Limited
- Heating apparatus and chemical vapor deposition system6 Oct 2026US 12,753,508 B2PlayNitride Display Co., Ltd.
- Apparatus for conducting plasma surface treatment, board treatment system having the same, and method of manufacturing semiconductor devices using the same6 Oct 2026US 12,755,942 B2New Power Plasma Co., Ltd.
- Reactant vapor delivery systems for semiconductor processing tools and methods8 Oct 2026US 2026/0308757 A1ASM IP Holding B. V.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Atomic layer deposition reaction chamber and an atomic layer deposition reactor1 Oct 2026US 2026/0297747 A1Beneq Oy
- Substrate stage and substrate processing apparatus1 Oct 2026US 2026/0297750 A1Tokyo Electron Limited
- Plasma and Photon assisted Metal-Organic Chemical Vapor Deposition24 Sep 2026US 2026/0286510 A1PhantaField Inc.
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Stage having electrostatic chuck and plasma processing apparatus using same921US 5,382,311 ATokyo Electron Limited · 1995
- High temperature multi-layered alloy heater assembly and related methods858US 6,035,101 AAPPLIED Materials.Inc. · 2000
- Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween832US 5,781,693 AAPPLIED Materials.Inc. · 1998
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998