US 2026/0297747 A1Published application

Atomic layer deposition reaction chamber and an atomic layer deposition reactor

AssigneeBeneq Oy

InventorsMarkus BOSUND, Pekka SOININEN, Esko KARPPANEN, Pasi MERILÄINEN

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Abstract

An atomic layer deposition reaction chamber includes first and second ends, first and second side walls extending between the first and second ends, a longitudinal central axis, and a width central axis perpendicular to the longitudinal central axis. A gas inlet and a gas outlet are spaced apart along the longitudinal central axis. The reaction chamber includes an increasing width area between the first end and the width central axis, a decreasing width area between the width central axis and the second end, and a constant width area between the increasing width area and the decreasing width area. A width of the reaction chamber increases in the increasing width area, decreases in the decreasing width area, and remains constant in the constant width area. A length of the reaction chamber is greater than a width of the reaction chamber along the width central axis.

Claims20

Dependent claims

An atomic layer deposition reaction chamber, comprising:

a first end;
a second end opposite the first end;
a longitudinal central axis extending between the first end and the second end;
a length between the first end and the second end in a direction of the longitudinal central axis;
a first side wall extending between the first end and the second end;
a second side wall opposite the first side wall and extending between the first end and the second end, the first side wall and the second side wall defining a width of the reaction chamber between the first end and the second end;
a width central axis extending between the first side wall and the second side wall and perpendicular to the longitudinal central axis;
a gas inlet configured to supply gas into the reaction chamber;
and
a gas outlet configured to discharge gas from the reaction chamber,
wherein the gas inlet and the gas outlet are spaced apart from one another along the longitudinal central axis,
wherein the reaction chamber comprises an increasing width area between the first end and the width central axis, the width of the reaction chamber in the increasing width area increasing along the longitudinal central axis in a direction from the first end toward the width central axis,
wherein the reaction chamber comprises a decreasing width area between the width central axis and the second end, the width of the reaction chamber in the decreasing width area decreasing along the longitudinal central axis in a direction from the width central axis toward the second end,
wherein the reaction chamber comprises a constant width area between the increasing width area and the decreasing width area, the width of the reaction chamber in the constant width area being constant along the longitudinal central axis, and
wherein the length of the reaction chamber is greater than the width of the reaction chamber along the width central axis.

12 more elements

An atomic layer deposition reactor, comprising:

a vacuum chamber;
and
a reaction chamber arranged inside the vacuum chamber, the reaction chamber comprising:
a first end,
a second end opposite the first end,
a longitudinal central axis extending between the first end and the second end,
a length between the first end and the second end along the longitudinal central axis,
a first side wall extending between the first end and the second end,
a second side wall opposite the first side wall and extending between the first end and the second end,
a width central axis extending between the first side wall and the second side wall and perpendicular to the longitudinal central axis,
a width between the first side wall and the second side wall in a direction of the width central axis,
a gas inlet configured to supply gas into the reaction chamber, and
a gas outlet configured to discharge gas from the reaction chamber,
wherein the gas inlet and the gas outlet are spaced apart from one another on opposite sides of the width central axis along the longitudinal central axis,
wherein the first side wall and the second side wall define an increasing width area in which the width of the reaction chamber increases along the longitudinal central axis in a direction from the gas inlet toward the width central axis,
wherein the first side wall and the second side wall define a decreasing width area in which the width of the reaction chamber decreases along the longitudinal central axis in a direction from the width central axis toward the gas outlet,
wherein the first side wall and the second side wall define a constant width area between the increasing width area and the decreasing width area, the width of the reaction chamber in the constant width area being constant along the longitudinal central axis, and
wherein the length of the reaction chamber is greater than the width of the reaction chamber along the width central axis.

15 more elements

Dependencies are inferred from the claim text.

Facts

Application: 19/695,556Filed 2 Jun 2026
Priority: FI 2021585313 Aug 2021
Published: 1 Oct 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification5 codes

C23C 16/45551
Having arrangements for gas injection at different locations of the reactor for each ALD half-reaction: for relative movement of the substrate and…
C23C 16/45502
Characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber: flow conditions in…
C23C 16/45563
Characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber: gas nozzles
C23C 16/4583
Rigid and flat substrates, e.g. plates or discs: the substrate being supported substantially horizontally