C23C 16/4585
Devices at or outside the perimeter of the substrate support
Official title: {Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds}
C23C16/4585 (Devices at or outside the perimeter of the substrate support) appears on 686 US grants and 984 published applications in this corpus.
Search patents in C23C- Granted patents
- 686
- Published applications
- 984
- Assignees
- 229
- Inventors
- 2,261
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 3 | 0 |
| 1993 | 6 | 0 |
| 1994 | 4 | 0 |
| 1995 | 7 | 0 |
| 1996 | 15 | 0 |
| 1997 | 10 | 0 |
| 1998 | 14 | 0 |
| 1999 | 17 | 0 |
| 2000 | 22 | 0 |
| 2001 | 21 | 9 |
| 2002 | 15 | 11 |
| 2003 | 14 | 20 |
| 2004 | 13 | 15 |
| 2005 | 10 | 27 |
| 2006 | 4 | 13 |
| 2007 | 7 | 22 |
| 2008 | 4 | 15 |
| 2009 | 6 | 20 |
| 2010 | 11 | 26 |
| 2011 | 12 | 22 |
| 2012 | 7 | 28 |
| 2013 | 13 | 34 |
| 2014 | 24 | 37 |
| 2015 | 20 | 46 |
| 2016 | 32 | 42 |
| 2017 | 21 | 47 |
| 2018 | 29 | 39 |
| 2019 | 36 | 42 |
| 2020 | 37 | 49 |
| 2021 | 29 | 64 |
| 2022 | 38 | 78 |
| 2023 | 41 | 92 |
| 2024 | 46 | 64 |
| 2025 | 65 | 75 |
| 2026 | 33 | 47 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing apparatus6 Oct 2026US 12,753,507 B2Tokyo Electron Limited
- Structures and methods for processing a semiconductor substrate22 Sep 2026US 12,742,237 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Pocket heater with purge to improve gap tolerance15 Sep 2026US 12,735,789 B2APPLIED Materials.Inc.
- Wafer carrier assembly with improved temperature uniformity15 Sep 2026US 12,735,790 B2Veeco Instruments Inc.
- Lift pin actuators for semiconductor processing systems and related methods15 Sep 2026US 12,740,376 B2ASM IP Holding B. V.
- A thin-film deposition apparatus reaction chamber24 Sep 2026US 2026/0286520 A1Picosun Oy
- Susceptor rings for use in reactor systems, susceptor ring assemblies including susceptor rings, and related methods17 Sep 2026US 2026/0275525 A1ASM IP Holding B. V.
- Method, assembly and system for gas injection and control3 Sep 2026US 2026/0262477 A1ASM IP Holding B. V.
- Substrate backside protection20 Aug 2026US 2026/0242942 A1Picosun Oy
- Substrate processing apparatus with flow control ring, and substrate processing method6 Aug 2026US 2026/0226618 A1ASM IP Holding B. V.
Most cited
By later US patents
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Integrated module multi-chamber CVD processing system and its method for processing substrates655US 5,494,494 AAnelva Corporation · 1996
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Isolation of incompatible processes in a multi-station processing chamber577US 6,143,082 ANovellus Systems, Inc. · 2000
- CVD reactor apparatus568US 5,574,247 AHitachi, Ltd. · 1996