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US 2026/0286520 A1Published application
A thin-film deposition apparatus reaction chamber
AssigneePicosun Oy
InventorsTimo VÄHÄ-OJALA, Tom BLOMBERG, Mikko NÄSI
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Abstract
An apparatus, comprising a main body part of a laminar flow reaction chamber (120) comprising an inlet opening for precursor gas at its front side, an exhaust opening (190) at its rear side, and a lid opening at its top or bottom side, and a substrate holder (140) configured to accommodate a batch of substrates (130), the surfaces of the substrates facing each other thus forming a substrate stack, the substrate holder (140) forming a lid to cover the lid opening.
Claims25
An apparatus, comprising:
- a main body part of a laminar flow reaction chamber comprising an inlet opening for precursor gas at its front side, an exhaust opening at its rear side, and a lid opening at its top or bottom side;
- and
- a substrate holder configured to accommodate a batch of substrates, the surfaces of the substrates facing each other thus forming a substrate stack, the substrate holder forming a lid to cover the lid opening.
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Dependencies are inferred from the claim text.