Pocket heater with purge to improve gap tolerance
AssigneeApplied Materials, Inc.
InventorsZubin Huang, Tomoharu Matsushita, Cheng-Hsiung Tsai
Life of this patent
Estimating the term…
Abstract
A substrate support includes a monolithic body. The monolithic body includes a central portion and a peripheral portion. The central portion includes a top surface recessed with respect to the peripheral portion. A shadow ring is configured to sit directly upon an upper surface of the peripheral portion, and overlaps a portion of a substrate positioned upon the central portion. A heating element embedded within the central portion heats the central portion, the peripheral portion, and the shadow ring.
Claims20
A substrate support, comprising:
- a monolithic body including a central portion bounded by a sloped inner wall of a peripheral portion, the central portion including:
- a top surface recessed with respect to the peripheral portion, and extending to the peripheral portion;
- an annular band protruding from the top surface, the band configured to receive a substrate thereon;
- a plurality of ports that open at the top surface into a groove formed between the band and the sloped inner wall;
- and
- a heater,
- wherein the sloped inner wall is sloped in a vertical plane extending upward and outward from the groove to an upper surface of the peripheral portion.
A substrate support, comprising:
- a monolithic body including a central portion bounded by a sloped inner wall of a peripheral portion, the central portion including:
- a top surface recessed with respect to the peripheral portion, extending to the inner wall of the peripheral portion, and including a raised band;
- a plurality of ports that open at the top surface into a groove formed between the raised band and the sloped inner wall, the plurality of ports positioned to direct a purge gas towards an underside of a substrate disposed on the band;
- and
- a heater,
- wherein the inner wall is sloped in a vertical plane extending upward and outward from the groove to an upper surface of the peripheral portion;
- and
- a shadow ring positioned directly upon an upper surface of the peripheral portion.
A processing chamber, comprising:
- a chamber body;
- and
- a substrate support enclosed in a processing volume within the chamber body, the substrate support comprising:
- a monolithic body including a central portion bounded by a sloped inner wall of a peripheral portion, the central portion including:
- a top surface recessed with respect to the peripheral portion, and extending to the peripheral portion;
- an annular band protruding from the top surface, the band configured to receive a substrate thereon;
- a plurality of ports that open at the top surface into a groove formed between the band and the sloped inner wall;
- and
- a heater,
- wherein the sloped inner wall is sloped in a vertical plane extending upward and outward from the groove to an upper surface of the peripheral portion;
- and
- a shadow ring positioned directly upon an upper surface of the peripheral portion.
Dependencies are inferred from the claim text.