CVD reactor apparatus

A CVD reactor apparatus for forming a CVD reaction film on a surface of a substrate in a reactor by using a reactive gas comprising:

• a substrate clamp for clamping a peripheral edge of a front of said substrate disposed in said reactor and dividing a space inside said reactor into a first space adjacent the front of said substrate and a second space adjacent a backside of said substrate, said substrate clamp having projections for providing, between said substrate clamp and the peripheral edge of the front of said clamped substrate, a gap through which the first space communicates with the second space;
• a first gas source which supplies a first gas to the first space, said first gas containing at least a CVD gas;
• a second gas source which supplies an inert gas, which does not contain CVD gas, to the second space at a pressure higher than a pressure prevailing in the first space so as to pass the inert gas supplied to the second space through said gap to thereby prevent the CVD gas prevailing in the first space from contacting the substrate backside and the substrate edge;
• a susceptor disposed adjacent the substrate backside in contact with said substrate;
• a heating light source, disposed exterior to said CVD reactor, which provides direct irradiation of radiation light through a transparent window to heat said susceptor, said susceptor providing heat conduction and heat radiation to heat said substrate;
• a cooler unit which cools the surface temperature of an inner wall of the reactor in contact with the CVD gas prevailing in the first space, except the substrate front, to a temperature equal to or lower than a deposition lower limit;
• and
• a plurality of lift pins fixed to said substrate clamp and operative to engage the backside of said substrate for suspending and lifting said substrate, wherein said susceptor is larger in size than said substrate, is formed with members which prevent said susceptor from contacting said substrate lift pins during vertical movement of said substrate lift pins so that only said substrate may be lifted by said lift pins, and is carried on said substrate susceptor pins.

A CVD reactor apparatus for forming a CVD reaction film on the surface of a substrate in a reactor, by using a reactive gas comprising:

• a substrate clamp for clamping a peripheral edge of a front of said substrate disposed in said reactor and dividing a space inside said reactor into a first space adjacent the front of said substrate and a second space adjacent a backside of said substrate, said substrate clamp having projections for providing, between said substrate clamp and the peripheral edge of the front of said clamped substrate, a gap through which the first space communicates with the second space;
• a first gas source which supplies a first gas to the first space, said first gas containing at least a CVD gas;
• a second gas source which supplies an inert gas, which does not contain CVD gas, to the second space at a pressure higher than a pressure prevailing in the first space to pass the inert gas supplied to the second space through said gap to thereby prevent the CVD gas prevailing in the first space from contacting the substrate backside and the substrate edge;
• a heater stage, which heats said substrate and is disposed adjacent the substrate backside in contact with said substrate and is heated by resistive heating to provide heat conduction and heat radiation;
• and
• a cooler unit which cools the surface temperature of an inner wall of the reactor in contact with the CVD gas prevailing in the first space, except the substrate front, to a temperature equal to or lower than a deposition lower limit;
• and
• a plurality of lift pins fixed to said substrate clamp and operative to engage the backside of said substrate for suspending and lifting said substrate, wherein said heater stage is larger in size than said substrate, and is formed with members which prevent said heater stage from contacting said substrate lifter pins during vertical movement of said substrate susceptor pins.