Susceptor rings for use in reactor systems, susceptor ring assemblies including susceptor rings, and related methods

A reactor system comprising:

• a reaction chamber comprising an injection end coupled to an injection flange and an exhaust end coupled to an exhaust flange;
• a susceptor ring assembly disposed within the reaction chamber, the susceptor ring assembly comprising:
• a monolithic susceptor ring comprising a susceptor plate having an upper surface and a lower surface, a first side member extending from the upper surface, a susceptor aperture extending from the upper surface to the lower surface, a first gas channel disposed within the first side member, and a first injection channel disposed within the first side member at a first injection angle, the first injection channel extending from the first gas channel to a first gas outlet disposed in a first inner edge;
• a first injector tube coupled to the first gas channel and at least partially disposed within the first gas channel;
• and
• a susceptor at least partially disposed within the susceptor aperture and configured to support a substrate,
• wherein the first gas outlet is configured to independently provide a first flow of a gas into the reaction chamber and the injection flange is configured to independently provide a second flow of the gas into the reaction chamber and the first flow is substantially perpendicular to the second flow.

A method of injecting a gas into a reaction chamber, the method comprising:

• seating a substrate on a susceptor ring assembly within a reaction chamber of a reactor system, the susceptor ring assembly comprising:
• a monolithic susceptor ring comprising a susceptor plate having an upper surface and a lower surface, a first side member extending from the upper surface, and a susceptor aperture extending from the upper surface to the lower surface;
• a first gas channel disposed within the first side member;
• and a first injection channel disposed within the first side member at a first injection angle, the first injection channel extending from the first gas channel to a first gas outlet disposed in a first inner edge;
• a first injector tube coupled to the first gas channel and at least partially disposed within the first gas channel;
• a rotatable susceptor at least partially disposed within the susceptor aperture;
• supplying the gas to the first injector tube at least partially disposed within the first gas channel;
• flowing the gas supplied from the first injector tube to the first injection channel;
• injecting a first flow of the gas supplied from the first injection channel from the first gas outlet on to the substrate seated on the rotatable susceptor of the susceptor ring assembly;
• and
• injecting a second flow of the gas from an injection flange coupled to the reaction chamber.