Substrate processing apparatus with flow control ring, and substrate processing method
AssigneeASM IP Holding B.V.
InventorNaoto Tsuji
Life of this patent
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Abstract
Examples of a substrate processing apparatus includes a chamber, a susceptor provided in the chamber, a shower head provided above the susceptor, and a flow control ring having a shape to surround the susceptor, the flow control ring having a first top surface and a second top surface that has an annular shape and is provided closer to an inner edge of the flow control ring than the first top surface at a higher level than the first top surface, the second top surface being a sloped surface whose height decreases toward the first top surface.
Claims20
A substrate processing apparatus, comprising:
- a chamber;
- a susceptor provided in the chamber;
- a shower head provided above the susceptor;
- a flow control ring configured to surround the susceptor;
- an annular exhaust duct;
- and
- an annular slit formed between the flow control ring and the annular exhaust duct,
- wherein the flow control ring comprises an inner edge surface and a top surface comprising a first top surface and a second top surface, wherein the second top surface, in a cross section of a vertical plane extending through a diameter of the flow control ring, comprises a sloped surface connecting the inner edge surface to the first top surface,
- wherein the first top surface is a planar surface and defines a lower boundary of the slit.
A substrate processing apparatus, comprising:
- a chamber;
- a susceptor provided in the chamber;
- a shower head provided above the susceptor;
- a flow control ring configured to surround the susceptor;
- an annular exhaust duct;
- and
- an annular slit formed between the flow control ring and the annular exhaust duct,
- wherein the susceptor comprises an edge surface and a top surface comprising of a central top surface and an annular peripheral top surface, wherein the peripheral top surface, in a cross section of a vertical plane extending through a diameter of the susceptor, comprises a sloped surface connecting the central top surface to the edge surface, and
- wherein the flow control ring comprises a planar flow control ring top surface defining a lower boundary of the slit.
Dependencies are inferred from the claim text.