Substrate stage and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsMotoi YAMAGATA, Haitang ZHANG, Naoya FUKUDA, Yuki MOTOMURA
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Abstract
A substrate stage, including: a stage on which a substrate is placed; a stage support mechanism configured to support the stage; and a cooling mechanism configured to cool the stage, wherein the stage has a contact surface located on a rear surface of the stage and formed radially outward of a support portion of the stage supported by the stage support mechanism, and wherein the cooling mechanism includes: a cold link; a cooler configured to cool the cold link; and a heat transfer plate provided between the contact surface of the stage and the cold link.
Claims20
A substrate stage, comprising:
- a stage on which a substrate is placed;
- a stage support mechanism configured to support the stage;
- and
- a cooling mechanism configured to cool the stage,
- wherein the stage has a contact surface located on a rear surface of the stage and formed radially outward of a support portion of the stage supported by the stage support mechanism, and
- wherein the cooling mechanism includes:
- a cold link;
- a cooler configured to cool the cold link;
- and
- a heat transfer plate provided between the contact surface of the stage and the cold link.
Dependencies are inferred from the claim text.