C23C 16/4586
Elements in the interior of the support
Official title: {Elements in the interior of the support, e.g. electrodes, heating or cooling devices}
C23C16/4586 (Elements in the interior of the support) appears on 939 US grants and 1,472 published applications in this corpus.
Search patents in C23C- Granted patents
- 939
- Published applications
- 1,472
- Assignees
- 291
- Inventors
- 3,099
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 6 | 0 |
| 1995 | 8 | 0 |
| 1996 | 11 | 0 |
| 1997 | 11 | 0 |
| 1998 | 17 | 0 |
| 1999 | 14 | 0 |
| 2000 | 27 | 0 |
| 2001 | 17 | 9 |
| 2002 | 23 | 27 |
| 2003 | 13 | 24 |
| 2004 | 15 | 24 |
| 2005 | 13 | 29 |
| 2006 | 9 | 34 |
| 2007 | 8 | 27 |
| 2008 | 8 | 27 |
| 2009 | 7 | 39 |
| 2010 | 19 | 31 |
| 2011 | 15 | 25 |
| 2012 | 15 | 36 |
| 2013 | 13 | 22 |
| 2014 | 17 | 27 |
| 2015 | 24 | 37 |
| 2016 | 23 | 40 |
| 2017 | 25 | 57 |
| 2018 | 29 | 81 |
| 2019 | 41 | 95 |
| 2020 | 60 | 97 |
| 2021 | 56 | 112 |
| 2022 | 62 | 140 |
| 2023 | 77 | 141 |
| 2024 | 85 | 113 |
| 2025 | 110 | 103 |
| 2026 | 57 | 75 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Chamber for backside deposition24 Sep 2026US 2026/0286526 A1APPLIED Materials.Inc.
- Substrate Support and Substrate Processing Apparatus24 Sep 2026US 2026/0286527 A1Tokyo Electron Limited
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Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Stage having electrostatic chuck and plasma processing apparatus using same921US 5,382,311 ATokyo Electron Limited · 1995
- High temperature multi-layered alloy heater assembly and related methods858US 6,035,101 AAPPLIED Materials.Inc. · 2000
- Wafer support system670US 6,053,982 AASM America, Inc. · 2000
- Multi-zone resistance heater664US 6,740,853 B1Tokyo Electron Limited · 2004