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US 2026/0286515 A1Published application
A thin-film deposition apparatus for batch processing
AssigneePicosun Oy
InventorsTimo VÄHÄ-OJALA, Tom BLOMBERG
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Abstract
A substrate processing apparatus (100), comprising a reaction chamber (120) configured to accommodate a batch of substrates (130) arranged with their surfaces facing each other thus forming a substrate stack, and a fluid distributor (600) for establishing a fluid flow to the reaction chamber (120), wherein the fluid distributor (600) is configured to spread the fluid flow in a height direction of the substrate stack so as to enable a laminar flow to be developed within the reaction chamber to propagate through the length of said reaction chamber and the substrate stack WO
Claims20
A substrate processing apparatus comprising:
- a reaction chamber configured to accommodate a batch of substrates arranged with their surfaces facing each other thus forming a substrate stack;
- and
- a fluid distributor for establishing a fluid flow to the reaction chamber, wherein the fluid distributor is configured to spread the fluid flow in a height direction of the substrate stack so as to enable a laminar flow to be developed within the reaction chamber to propagate through the length of said reaction chamber and the substrate stack.
Dependencies are inferred from the claim text.