Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment

A chemical vapor deposition comprising:

• (a) a reaction chamber defining a reactant gas flow path therethrough and having a bottom surface with a tubular shaft depending therefrom;
• (b) drive shaft means defining a rotational axis, said drive shaft means having a top end disposed in said reaction chamber and depending in spaced coaxial relationship through the tubular shaft thereof to provide an intermediate portion and a lower portion which extends below the tubular shaft of said reaction chamber;
• (c) a support plate in downwardly spaced relationship with said reaction chamber and defining an opening which is coaxial with said drive shaft means;
• (d) mounting means on said support plate and attached to the tubular shaft of said reaction chamber, said mounting means defining an axial opening which is coaxial with the opening of said support plate and through which said drive means axially extends;
• (e) bearing means dependingly attached to said mounting means in circumscribing engagement with the intermediate portion of said drive shaft means for supporting and rotatable journaling of said drive shaft means;
• (f) drive means coupled to the lower end of said drive shaft means for rotational driving thereof;
• (g) spider means on the top end of said drive shaft means for rotation therewith;
• and
• (h) a susceptor defining a top surface for demountably receiving a substrate for deposition purposes in a position wherein the center of the substrate is in a substantially aligned overlaying relationship with the center of said susceptor, said susceptor being mounted on said spider means for rotation therewith and being supported thereby in a position wherein the rotational axis off said drive means is normal with respect to the center of said susceptor.