Y10S 430/106
Binder containing
Y10S430/106 (Binder containing) appears on 2,507 US grants and 1,396 published applications in this corpus.
Search patents in Y10S- Granted patents
- 2,507
- Published applications
- 1,396
- Assignees
- 413
- Inventors
- 3,061
- Latest grant
- 23 Aug 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 15 | 0 |
| 1977 | 29 | 0 |
| 1978 | 13 | 0 |
| 1979 | 10 | 0 |
| 1980 | 20 | 0 |
| 1981 | 49 | 0 |
| 1982 | 20 | 0 |
| 1983 | 21 | 0 |
| 1984 | 27 | 0 |
| 1985 | 32 | 0 |
| 1986 | 26 | 0 |
| 1987 | 23 | 0 |
| 1988 | 18 | 0 |
| 1989 | 32 | 0 |
| 1990 | 44 | 0 |
| 1991 | 43 | 0 |
| 1992 | 29 | 0 |
| 1993 | 47 | 0 |
| 1994 | 58 | 0 |
| 1995 | 43 | 0 |
| 1996 | 41 | 0 |
| 1997 | 39 | 0 |
| 1998 | 53 | 0 |
| 1999 | 81 | 0 |
| 2000 | 110 | 0 |
| 2001 | 94 | 39 |
| 2002 | 77 | 155 |
| 2003 | 132 | 192 |
| 2004 | 181 | 144 |
| 2005 | 115 | 143 |
| 2006 | 129 | 119 |
| 2007 | 133 | 105 |
| 2008 | 92 | 127 |
| 2009 | 159 | 164 |
| 2010 | 133 | 81 |
| 2011 | 130 | 44 |
| 2012 | 90 | 44 |
| 2013 | 31 | 19 |
| 2014 | 48 | 12 |
| 2015 | 30 | 4 |
| 2016 | 3 | 2 |
| 2017 | 3 | 1 |
| 2018 | 2 | 0 |
| 2019 | 1 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 1 |
| 2022 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same23 Aug 2022US 11,424,163 B2Gwangju Institute of Science and Technology
- Photoacid generators and lithographic resists comprising the same4 Jun 2019US 10,310,375 B2
- Polymers and photoresist compositions29 May 2018US 9,983,477 B2Rohm and Haas Electronic Materials LLC
- Radiation-sensitive composition20 Feb 2018US 9,897,913 B2Mitsubishi Gas Chemical Company, Inc.
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same24 Oct 2017US 9,798,235 B2FUJIFILM Corporation
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same4 Mar 2021US 2021/0066131 A1Gwangju Institute of Science and Technology
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same7 Sep 2017US 2017/0255098 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same22 Dec 2016US 2016/0370701 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same30 Jun 2016US 2016/0187780 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same23 Jul 2015US 2015/0205205 A1FUJIFILM Corporation
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Photoresist monomers, polymers thereof and photoresist compositions containing it483US 6,514,666 B1Hyundai Electronics Industries Co., Ltd. · 2003
- Polymer and a forming method of a micro pattern using the same482US 6,316,162 B1Hyundai Electronics Industries Co., Ltd. · 2001
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Method of making a semiconductor device utilizing a light-sensitive etching agent477US 3,960,559 AFuji Photo Film Co., Ltd. · 1976