Y10S 430/111
Polymer of unsaturated acid or ester
Y10S430/111 (Polymer of unsaturated acid or ester) appears on 1,230 US grants and 742 published applications in this corpus.
Search patents in Y10S- Granted patents
- 1,230
- Published applications
- 742
- Assignees
- 221
- Inventors
- 1,538
- Latest grant
- 29 May 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 8 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 6 | 0 |
| 1981 | 20 | 0 |
| 1982 | 5 | 0 |
| 1983 | 6 | 0 |
| 1984 | 13 | 0 |
| 1985 | 15 | 0 |
| 1986 | 8 | 0 |
| 1987 | 10 | 0 |
| 1988 | 7 | 0 |
| 1989 | 12 | 0 |
| 1990 | 13 | 0 |
| 1991 | 22 | 0 |
| 1992 | 11 | 0 |
| 1993 | 17 | 0 |
| 1994 | 20 | 0 |
| 1995 | 21 | 0 |
| 1996 | 21 | 0 |
| 1997 | 20 | 0 |
| 1998 | 27 | 0 |
| 1999 | 44 | 0 |
| 2000 | 57 | 0 |
| 2001 | 46 | 22 |
| 2002 | 36 | 76 |
| 2003 | 58 | 86 |
| 2004 | 82 | 72 |
| 2005 | 60 | 89 |
| 2006 | 84 | 62 |
| 2007 | 79 | 51 |
| 2008 | 51 | 75 |
| 2009 | 82 | 87 |
| 2010 | 63 | 48 |
| 2011 | 78 | 25 |
| 2012 | 46 | 33 |
| 2013 | 24 | 8 |
| 2014 | 30 | 6 |
| 2015 | 17 | 2 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Polymers and photoresist compositions29 May 2018US 9,983,477 B2Rohm and Haas Electronic Materials LLC
- Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions16 May 2017US 9,650,451 B2Central Glass Company, Limited
- Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method12 Jan 2016US 9,233,919 B2Shin-Etsu Chemical Co., Ltd.
- Negative-type photoresist composition for thick film and use thereof27 Oct 2015US 9,170,491 B2Everlight Chemical Industrial Corporation
- Fluorinated monomer, polymer, resist composition, and patterning process25 Aug 2015US 9,115,074 B2Shin-Etsu Chemical Co., Ltd.
- (meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it2 Jul 2015US 2015/0183912 A1NEC Corporation
- Negative-type photoresist composition for thick film and use thereof30 Apr 2015US 2015/0118617 A1Everlight Chemical Industrial Corporation
- Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method2 Oct 2014US 2014/0296561 A1Shin-Etsu Chemical Co., Ltd.
- Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions19 Jun 2014US 2014/0171584 A1Central Glass Company, Limited
- Resist composition, method of forming resist pattern, novel compound, and acid generator1 May 2014US 2014/0120472 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Photoresist monomers, polymers thereof and photoresist compositions containing it483US 6,514,666 B1Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist471US 6,811,960 B2Hyundai Electronics Industries Co., Ltd. · 2004
- Photoresist polymer and photoresist composition containing the same471US 7,279,256 B2Hynix Semiconductor Inc. · 2007