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US 9,115,074 B2Granted
Fluorinated monomer, polymer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasayoshi Sagehashi, Koji Hasegawa, Takeshi Sasami
Life of this patent
Estimating the term…
Abstract
A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
Claims1
A fluorinated monomer having the general formula (1):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2 and R3 are each independently hydrogen or a straight, branched or cyclic C1-C15 monovalent hydrocarbon group, R2 and R3 may bond together to form a non-aromatic ring with the carbon atom to which they are attached, R4 to R6 each are a C1-C6 monovalent fluorinated hydrocarbon group, A is a straight, branched or cyclic C1-C10 divalent hydrocarbon group, and k1 is an integer of 0 to 2.
Dependencies are inferred from the claim text.