Y10S 430/107
Polyamide or polyurethane
Y10S430/107 (Polyamide or polyurethane) appears on 311 US grants and 94 published applications in this corpus.
Search patents in Y10S- Granted patents
- 311
- Published applications
- 94
- Assignees
- 114
- Inventors
- 613
- Latest grant
- 22 Sep 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 3 | 0 |
| 1978 | 5 | 0 |
| 1979 | 4 | 0 |
| 1980 | 5 | 0 |
| 1981 | 8 | 0 |
| 1982 | 6 | 0 |
| 1983 | 5 | 0 |
| 1984 | 4 | 0 |
| 1985 | 5 | 0 |
| 1986 | 8 | 0 |
| 1987 | 3 | 0 |
| 1988 | 5 | 0 |
| 1989 | 15 | 0 |
| 1990 | 8 | 0 |
| 1991 | 12 | 0 |
| 1992 | 10 | 0 |
| 1993 | 17 | 0 |
| 1994 | 13 | 0 |
| 1995 | 13 | 0 |
| 1996 | 8 | 0 |
| 1997 | 9 | 0 |
| 1998 | 4 | 0 |
| 1999 | 7 | 0 |
| 2000 | 18 | 0 |
| 2001 | 16 | 0 |
| 2002 | 4 | 12 |
| 2003 | 11 | 13 |
| 2004 | 5 | 11 |
| 2005 | 12 | 9 |
| 2006 | 12 | 5 |
| 2007 | 3 | 8 |
| 2008 | 6 | 11 |
| 2009 | 9 | 11 |
| 2010 | 10 | 4 |
| 2011 | 7 | 5 |
| 2012 | 6 | 3 |
| 2013 | 1 | 1 |
| 2014 | 9 | 1 |
| 2015 | 3 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Aromatic diamines containing three ether-linked-benzonitrile moieties, polymers thereof, and methods of making the same22 Sep 2015US 9,139,696 B1The United States of America as represented by the Secretary of the Air Force
- Photosensitive polyimides13 Jan 2015US 8,932,801 B2Eternal Chemical Co., Ltd.
- Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane6 Jan 2015US 8,927,195 B2FUJIFILM Corporation
- Resist composition, method of forming resist pattern, polymeric compound and method of producing the same16 Dec 2014US 8,911,928 B2Tokyo Ohka Kogyo.Co., Ltd.
- Negative-type photosensitive resin composition, pattern forming method and electronic parts28 Oct 2014US 8,871,422 B2Hitachi Chemical Dupont Microsystems, Ltd.
- Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane15 May 2014US 2014/0134540 A1FUJIFILM Corporation
- Positive Photosensitive Resin Composition, and Display Device and Organic Light Emitting Device Using the Same4 Jul 2013US 2013/0171564 A1Cheil Industries Inc.
- Resist composition, method of forming resist pattern, polymeric compound and method of producing the same6 Dec 2012US 2012/0308928 A1Tokyo Ohka Kogyo.Co., Ltd.
- Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same29 Nov 2012US 2012/0301826 A1LG Chem.Ltd.
- Photosensitive modified polyimide resin composition and use thereof26 Apr 2012US 2012/0097435 A1Pi R&D Co., Ltd.
Most cited
By later US patents
- Energy curable compositions: two component curing agents227US 4,985,340 AMinnesota Mining and Manufacturing Company · 1991
- Polyimides, a process for their preparation and their use90US 4,629,777 ACiba-Geigy Corporation · 1986
- Method of repairing teeth using a composition which is curable by irradiation with visible light75US 4,089,763 AImperial Chemical Industries PLC · 1978
- Positive photosensitive composition74US 5,945,250 AFuji Photo Film Co., Ltd. · 1999
- Photographic elements coated with protective overcoats65US 4,092,173 AEastman Kodak Company · 1978