Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
AssigneeLG Chem, Ltd.
InventorsChan Hyo Park, Sang Woo Kim, Kyung Jun Kim, Hye Ran Seong, Se Jin Shin, Dong Hyun Oh
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Abstract
Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings.
Claims17
A photosensitive polyimide-based polymer comprising at least one compound selected from the group consisting of compound represented by Formula 1:
- wherein each Z is a tetravalent organic group derived from one or more tetracarboxylic acids, including 3,4-dicarboxy-1,2,3,4-tetrahydro-6-tert-butyl-1-naphthalene succinic dianhydride (DTBDA), or derivatives thereof, a is from 1 to 150, b is from 1 to 400, Y1 is a divalent organic group derived from a diamine and is selected from
- and Y2 is a divalent aliphatic group or aromatic organic group derived from a diamine;
- a compound represented by Formula 2:
- wherein Z is as defined in Formula 1, Y3 is selected from Y1 and Y2 defined in the formula 1 and combinations thereof, and c is from 5 to 200;
- and
- a compound represented by Formula 3:
- wherein Z is as defined in Formula 1, Y3 is as defined in the formula 2, and d is from 5 to 200.
A photosensitive polyimide-based polymer comprising at least one compound selected from the group consisting of a compound represented by Formula 4:
- wherein Y4 is a divalent organic group derived from a diamine and is selected from
- Y5 is a divalent aliphatic group or aromatic organic group derived from a diamine, e and f are from 1 to 150 and from 1 to 400, respectively;
- a compound represented by Formula 5:
- wherein Y6 is a divalent organic group derived from a diamine and g is from 5 to 200;
- and
- a compound represented by Formula 6:
- wherein Y6 is a divalent organic group derived from a diamine, R is selected from the group consisting of alkyl and silyl alkyl groups, and h is from 5 to 200.
Dependencies are inferred from the claim text.